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Showing results 1 to 9 of 9

Issue DateTitleAuthor(s)TypeView
201712Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer depositionKim, Kangsik; Oh, Il-Kwon; Kim, Hyungjun; Lee, ZonghoonARTICLE35
201711Catalytic chemical vapor deposition of large-area uniform two-dimensional molybdenum disulfide using sodium chlorideSong, Jeong-Gyu; Ryu, Gyeong Hee; Kim, Youngjun; Woo, Whang Je; Ko, Kyung Yong; Kim, Yongsung; Lee, Changseung; Oh, Il-Kwon; Park, Jusang; Lee, Zonghoon; Kim, HyungjunARTICLE5
201610Effect of Al2O3 deposition on performance of top-gated monolayer MoS2 based field effect transistorSong, Jeong-Gyu; Kim, Seok Jin; Woo, Whang Je; Kim, Youngjin; Oh, Il-Kwon; Ryu, Gyeong Hee; Lee, Zonghoon; Lim, Jun Hyung; Park, Jusang; Kim, HyungjunARTICLE173
201501Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer DepositionOh, Il-Kwon; Kim, Kangsik; Lee, Zonghoon; Ko, Kyung Yong; Lee, Chang-Wan; Lee, Su Jeong; Myung, Jae Min; Lansalot-Matras, Clement; Noh, Wontae; Dussarrat, Christian; Kim, Hyungjun; Lee, Han-Bo-RamARTICLE297
201505In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxidesOh, Il-Kwon; Kim, Kangsik; Lee, Zonghoon; Song, Jeong-Gyu; Lee, Chang Wan; Thompson, David; Lee, Han-Bo-Ram; Kim, Woo-Hee; Maeng, Wan Joo; Kim, HyungjunARTICLE405
201509Nucleation and Growth of the HfO2 Dielectric Layer for Graphene-Based DevicesOh, Il-Kwon; Tanskanen, Jukka; Jung, Hanearl; Kim, Kangsik; Lee, Mi Jin; Lee, Zonghoon; Lee, Seoung-Ki; Ahn, Jong-Hyun; Lee, Chang Wan; Kim, Kwanpyo; Kim, Hyungjun; Lee, Han-Bo-RamARTICLE290
201608Surface treatment process applicable to next generation graphene-based electronicsKim, Ki Seok; Hong, Hyo-Ki; Jung, Haneal; Oh, Il-Kwon; Lee, Zonghoon; Kim, Hyungjun; Yeom, Geun Young; Kim, Kyong NamARTICLE286
201403Synthesis of wafer-scale uniform molybdenum disulfide films with control over the layer number using a gas phase sulfur precursorLee, Youngbin; Lee, Jinhwan; Bark, Hunyoung; Oh, Il-Kwon; Ryu, Gyeong Hee; Lee, Zonghoon; Kim, Hyungjun; Cho, Jeong Ho; Ahn, Jong-Hyun; Lee, ChangguARTICLE357
201611Very high frequency plasma reactant for atomic layer depositionOh, Il-Kwon; Yoo, Gilsang; Yoon, Chang Mo; Kim, Tae Hyung; Yeom, Geun Young; Kim, Kangsik; Lee, Zonghoon; Jung, Hanearl; Lee, Chang Wan; Kim, Hyungjun; Lee, Han-Bo-RamARTICLE231
Showing results 1 to 9 of 9

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