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Shin, Hyung-Joon
Nanoscale Materials Science Lab (NMSL)
Research Interests
  • Scanning tunneling microscopy, surface science, interface science, nanomaterials


Controlling Dissociation Reaction of a Water Molecule on Ultrathin film

DC Field Value Language Jung, Jaehoon ko Shin, Hyung-Joon ko Kawai, Maki ko Kim, Yousoo ko 2015-01-09T00:02:58Z - 2015-01-08 ko 2014-09 ko
dc.identifier.citation Hyomen Kagaku, v.35, no.9, pp.486 - 491 ko
dc.identifier.issn 0388-5321 ko
dc.identifier.uri -
dc.description.abstract We have recently intensively studied the dissociation of individual water molecules on ultrathin MgO film grown on Ag(100) substrate at the single-molecule level, by means of both scanning tunneling microscopy experiment and density functional theory calculations. We have found clear evidence for that the chemical reactivity of ultrathin MgO film can be controlled by the film thickness, in which the interfacial interaction between oxide and metal substrate plays an important role in determining chemical reactivity. In this short review, we briefly discuss the role of the ultrathin insulating film in water dissociation induced by vibrationally excited state using inelastic tunneling electrons, which is crucial to selectively achieve two kinds of dissociation path, as well as underlying thickness dependence of chemical reactivity. ko
dc.description.statementofresponsibility open -
dc.language 영어 ko
dc.publisher The Surface Science Society of Japan ko
dc.title Controlling Dissociation Reaction of a Water Molecule on Ultrathin film ko
dc.type ARTICLE ko
dc.type.rims ART ko
dc.identifier.doi 10.1380/jsssj.35.486 ko
dc.identifier.url ko
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