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신형준

Shin, Hyung-Joon
Nanoscale Materials Science Lab.
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dc.citation.endPage 491 -
dc.citation.number 9 -
dc.citation.startPage 486 -
dc.citation.title Hyomen Kagaku -
dc.citation.volume 35 -
dc.contributor.author Jung, Jaehoon -
dc.contributor.author Shin, Hyung-Joon -
dc.contributor.author Kawai, Maki -
dc.contributor.author Kim, Yousoo -
dc.date.accessioned 2023-12-22T02:12:16Z -
dc.date.available 2023-12-22T02:12:16Z -
dc.date.created 2015-01-08 -
dc.date.issued 2014-09 -
dc.description.abstract We have recently intensively studied the dissociation of individual water molecules on ultrathin MgO film grown on Ag(100) substrate at the single-molecule level, by means of both scanning tunneling microscopy experiment and density functional theory calculations. We have found clear evidence for that the chemical reactivity of ultrathin MgO film can be controlled by the film thickness, in which the interfacial interaction between oxide and metal substrate plays an important role in determining chemical reactivity. In this short review, we briefly discuss the role of the ultrathin insulating film in water dissociation induced by vibrationally excited state using inelastic tunneling electrons, which is crucial to selectively achieve two kinds of dissociation path, as well as underlying thickness dependence of chemical reactivity. -
dc.identifier.bibliographicCitation Hyomen Kagaku, v.35, no.9, pp.486 - 491 -
dc.identifier.doi 10.1380/jsssj.35.486 -
dc.identifier.issn 0388-5321 -
dc.identifier.uri https://scholarworks.unist.ac.kr/handle/201301/9992 -
dc.identifier.url https://www.jstage.jst.go.jp/article/jsssj/35/9/35_486/_article/-char/en -
dc.language 영어 -
dc.publisher The Surface Science Society of Japan -
dc.title Controlling Dissociation Reaction of a Water Molecule on Ultrathin film -
dc.type Article -
dc.description.isOpenAccess TRUE -
dc.description.journalRegisteredClass foreign -

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