dc.citation.endPage |
344 |
- |
dc.citation.number |
3 |
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dc.citation.startPage |
341 |
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dc.citation.title |
JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY |
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dc.citation.volume |
14 |
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dc.contributor.author |
Kim, J.-B. |
- |
dc.contributor.author |
Jang, Ji-Hyun |
- |
dc.contributor.author |
Kim, H.-W. |
- |
dc.contributor.author |
Woo, S.-G. |
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dc.date.accessioned |
2023-12-22T12:06:18Z |
- |
dc.date.available |
2023-12-22T12:06:18Z |
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dc.date.created |
2014-11-18 |
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dc.date.issued |
2001 |
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dc.description.abstract |
A cyclopropyl group was introduced into the photoacid generator in order to give the photobleaching property at 193 nm. Cyclopropyldiphenylsulfonium trifluoromethanesulfonate (CpDP-Tf) was synthesized for this photobleaching effect. This compound is stable up to 165°C. The absorbance of CpDP-Tf at 193 nm decreases upon exposure. The resist containing CpDP-Tf gave the higher resolution comparing with that containing triphenyl-sulfonium trifluoromethanesulfonate. |
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dc.identifier.bibliographicCitation |
JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, v.14, no.3, pp.341 - 344 |
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dc.identifier.issn |
0914-9244 |
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dc.identifier.scopusid |
2-s2.0-0035747315 |
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dc.identifier.uri |
https://scholarworks.unist.ac.kr/handle/201301/9115 |
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dc.language |
영어 |
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dc.publisher |
TECHNICAL ASSOC PHOTOPOLYMERS |
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dc.title |
Photobleaching photoacid generator |
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dc.type |
Article |
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dc.description.journalRegisteredClass |
scopus |
- |