File Download
There are no files associated with this item.
SFX Link
- Find it @ UNIST can give you direct access to the published full text of this article. (UNISTARs only)
- Kim, Soo-Hyun
Views & Downloads
Detailed Information
Cited time in 
Cited time in 
Cited time in
Metadata Downloads
Zirconium Carbide (ZrCx) Thin Films as Next-generation Diffusion Barriers for Cu and Ru Interconnects Prepared by Plasma Enhanced Atomic Layer Deposition
- Author(s)
- Kweon, Minjeong, Park, Chaehyun, Kim, Sang Bok, Kim, Soo-Hyun
- Issued Date
- 2025-06-24
- Citation
- AVS 25th International Conference on Atomic Layer Deposition & the 12th International Atomic Layer Etching Workshop (ALD/ALE 2025)
- Publisher
- AVS (American Vacuum Society)
Items in Repository are protected by copyright, with all rights reserved, unless otherwise indicated.