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- Kim, Soo-Hyun
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Plasma-Enhanced Atomic Layer Deposition of High-Quality InN Thin Films Using a Novel In Precursor and NH3 Plasma
- Author(s)
- Kim, Yejun, Kweon, Minjeong, Park, Chaehyun, Kim, Soo-Hyun
- Issued Date
- 2025-06-24
- Citation
- AVS 25th International Conference on Atomic Layer Deposition & the 12th International Atomic Layer Etching Workshop (ALD/ALE 2025)
- Publisher
- AVS (American Vacuum Society)
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