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- Hur, Min Sup
- Computational Plasma Lab.
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| DC Field | Value | Language |
|---|---|---|
| dc.citation.endPage | 111 | - |
| dc.citation.number | 1 | - |
| dc.citation.startPage | 110 | - |
| dc.citation.title | IEEE TRANSACTIONS ON PLASMA SCIENCE | - |
| dc.citation.volume | 30 | - |
| dc.contributor.author | Hur, Min Sup | - |
| dc.contributor.author | Kim, SJ | - |
| dc.contributor.author | Lee, HS | - |
| dc.contributor.author | Lee, JK | - |
| dc.contributor.author | Yeom, GY | - |
| dc.date.accessioned | 2023-12-22T11:39:44Z | - |
| dc.date.available | 2023-12-22T11:39:44Z | - |
| dc.date.created | 2014-11-12 | - |
| dc.date.issued | 2002-02 | - |
| dc.description.abstract | Neutral beam processing is being considered as a new technique to reduce plasma-induced damage in materials processing. We report on particle-in-cell simulations of a neutral beam source. The system is composed of an ion-beam source and multireflectors which neutralize incident ions and reflect neutral particles. It is revealed from the simulations that about 2.8 % of the ion-current from an ion-beam source is successfully neutralized before reaching a diagnostic plate. | - |
| dc.identifier.bibliographicCitation | IEEE TRANSACTIONS ON PLASMA SCIENCE, v.30, no.1, pp.110 - 111 | - |
| dc.identifier.doi | 10.1109/TPS.2002.1003948 | - |
| dc.identifier.issn | 0093-3813 | - |
| dc.identifier.scopusid | 2-s2.0-0036478185 | - |
| dc.identifier.uri | https://scholarworks.unist.ac.kr/handle/201301/8797 | - |
| dc.identifier.url | http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=0036478185 | - |
| dc.identifier.wosid | 000175845900054 | - |
| dc.language | 영어 | - |
| dc.publisher | IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC | - |
| dc.title | Particle-in-cell simulation of a neutral beam source for materials processing | - |
| dc.type | Article | - |
| dc.description.journalRegisteredClass | scopus | - |
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