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유자형

Ryu, Ja-Hyoung
Supramolecular Nanomaterials Lab.
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dc.contributor.assignee 울산과학기술원 / (주)아이센스 -
dc.contributor.author 유자형 -
dc.contributor.author 김도현 -
dc.contributor.author 박가은 -
dc.contributor.author 양경석 -
dc.contributor.author 강근희 -
dc.contributor.author 신현서 -
dc.contributor.author 조주영 -
dc.contributor.author 김수진 -
dc.contributor.author 양보나 -
dc.contributor.author 최은성 -
dc.date.accessioned 2025-04-25T19:31:09Z -
dc.date.application 2021-07-21 -
dc.date.available 2025-04-25T19:31:09Z -
dc.date.registration 2025-02-19 -
dc.identifier.patentApplicationNumber 10-2021-0095828 -
dc.identifier.patentRegistrationNumber 10-2772209 -
dc.identifier.uri https://scholarworks.unist.ac.kr/handle/201301/86931 -
dc.title 고분자 재료의 표면 처리용 조성물, 키트 및 표면 처리 방법 -
dc.type Patent -
dc.publisher.country KO -
dc.type.iprs 특허 -

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