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신흥주

Shin, Heungjoo
Micro/Nano Integrated Systems Lab.
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DC Field Value Language
dc.contributor.assignee 울산과학기술원 -
dc.contributor.author 신흥주 -
dc.contributor.author 곽종현 -
dc.contributor.author 김범상 -
dc.date.accessioned 2024-11-19T16:35:35Z -
dc.date.application 2022-06-08 -
dc.date.available 2024-11-19T16:35:35Z -
dc.date.registration 2024-10-02 -
dc.identifier.patentApplicationNumber 10-2022-0069665 -
dc.identifier.patentRegistrationNumber 10-2715093 -
dc.identifier.uri https://scholarworks.unist.ac.kr/handle/201301/84504 -
dc.title 고온공정을 포함한 MEMS 제작공정에 적합한 실리콘 관통 전극 및 이의 제조방법 -
dc.type Patent -
dc.publisher.country KO -
dc.type.iprs 특허 -

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