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Kim, Kyung Rok
Nano-Electronic Emerging Devices Lab.
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dc.citation.endPage 508 -
dc.citation.number 4 -
dc.citation.startPage 505 -
dc.citation.title JOURNAL OF THE KOREAN PHYSICAL SOCIETY -
dc.citation.volume 41 -
dc.contributor.author Kim, DH -
dc.contributor.author Sung, SK -
dc.contributor.author Kim, Kyung Rok -
dc.contributor.author Lee, JD -
dc.contributor.author Park, BG -
dc.contributor.author Choi, BH -
dc.contributor.author Hwang, SW -
dc.contributor.author Ahn, D -
dc.date.accessioned 2023-12-22T11:36:47Z -
dc.date.available 2023-12-22T11:36:47Z -
dc.date.created 2014-10-28 -
dc.date.issued 2002-10 -
dc.description.abstract Single-electron transistors with sidewall depletion gates on a silicon-On-insulator (SOI) nanowire are proposed and were fabricated using a combination of conventional lithography and process technology. The island-size dependence of the electrical characteristics showed good controllability. Based on the high-voltage gain and the Coulomb oscillation peak position control by the sidewall gate voltage, the basic operation of a single-electron inverter was demonstrated at 12.5 K. -
dc.identifier.bibliographicCitation JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.41, no.4, pp.505 - 508 -
dc.identifier.issn 0374-4884 -
dc.identifier.scopusid 2-s2.0-0035981425 -
dc.identifier.uri https://scholarworks.unist.ac.kr/handle/201301/7935 -
dc.identifier.url http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=0035981425 -
dc.identifier.wosid 000178620000020 -
dc.language 영어 -
dc.publisher KOREAN PHYSICAL SOC -
dc.title Single-electron transistors with sidewall depletion gates on an SOI nanowire and their application to single-electron inverters -
dc.type Article -
dc.description.journalRegisteredClass scopus -

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