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DC Field | Value | Language |
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dc.citation.conferencePlace | US | - |
dc.citation.conferencePlace | Columbus, OH, U.S.A. | - |
dc.citation.title | AVS 66th International Symposium & Exhibition | - |
dc.contributor.author | Yoon, Hoon Hahn | - |
dc.contributor.author | Song, Wonho | - |
dc.contributor.author | Jung, Sungchul | - |
dc.contributor.author | Kim, Junhyung | - |
dc.contributor.author | Mo, Kyuhyung | - |
dc.contributor.author | Choi, Gahyun | - |
dc.contributor.author | Jeong, Hu Young | - |
dc.contributor.author | Lee, Jong Hoon | - |
dc.contributor.author | Park, Kibog | - |
dc.date.accessioned | 2024-01-31T23:37:13Z | - |
dc.date.available | 2024-01-31T23:37:13Z | - |
dc.date.created | 2020-01-09 | - |
dc.date.issued | 2019-10-23 | - |
dc.description.abstract | We report the direct observation revealing that the electric dipole layer originating from the off-centric distribution of interacting electrons at metal/graphene interface can induce the negative Fermi-level pinning effect in metal/graphene/semiconductor junction made on a semiconductor substrate containing regions with low interface-trap density. The graphene interlayer takes a role of diffusion barrier preventing the atomic intermixing at interface and preserving the low interface-trap density region. The change of electrostatic potential across the metal/graphene interface due to the interaction dipole layer and the doping of graphene is found to cause the negative Fermi-level pinning effect‚ supported by the Schottky barrier decreasing as metal work-function increasing. In case of metal/graphene/GaAs junction‚ the local small patches with very thin or no native oxide layer are considered to be responsible for the negative Fermi-level pinning. In the prevailing region with normal native oxides surrounding the small patches‚ the Fermi-level pinning appears to be strong. Meanwhile‚ the negative Fermi-level pinning is found to occur globally in metal/graphene/SiC junction where the SiC substrate is known to produce a low density of interface traps. This work provides an experimental method to form Schottky and Ohmic-like contacts simultaneously on a semiconductor substrate covered partially with graphene by using identical metal electrodes. | - |
dc.identifier.bibliographicCitation | AVS 66th International Symposium & Exhibition | - |
dc.identifier.uri | https://scholarworks.unist.ac.kr/handle/201301/79049 | - |
dc.language | 영어 | - |
dc.publisher | American Vacuum Society | - |
dc.title | Negative Fermi-level Pinning Effect Induced by Graphene Interlayer in Metal/Graphene/Semiconductor Junction | - |
dc.type | Conference Paper | - |
dc.date.conferenceDate | 2019-10-20 | - |
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