dc.citation.endPage |
U58 |
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dc.citation.number |
18 |
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dc.citation.startPage |
1089 |
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dc.citation.title |
ELECTRONICS LETTERS |
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dc.citation.volume |
44 |
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dc.contributor.author |
Kim, Kyung Rok |
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dc.contributor.author |
Park, B. -G. |
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dc.contributor.author |
Dutton, R. W. |
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dc.date.accessioned |
2023-12-22T08:37:39Z |
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dc.date.available |
2023-12-22T08:37:39Z |
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dc.date.created |
2014-10-27 |
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dc.date.issued |
2008-08 |
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dc.description.abstract |
Numerical simulations based on a novel band-to-band tunnelling model and DC quasi-stationary method have been performed for a field-induced inter-band tunnelling effect transistor with a degenerately doped floating body and source/drain tunnel junction. Carrier injection through the tunnel junctions into a floating body is responsible for negative-differential conductance as well as negative-differential trans-conductance. Simulation results for various device structures show that a gate field-effect on the tunnel junctions is a key design factor to improve device characteristics. |
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dc.identifier.bibliographicCitation |
ELECTRONICS LETTERS, v.44, no.18, pp.1089 - U58 |
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dc.identifier.doi |
10.1049/el:20082134 |
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dc.identifier.issn |
0013-5194 |
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dc.identifier.scopusid |
2-s2.0-50849101068 |
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dc.identifier.uri |
https://scholarworks.unist.ac.kr/handle/201301/7887 |
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dc.identifier.url |
http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=50849101068 |
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dc.identifier.wosid |
000259154600029 |
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dc.language |
영어 |
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dc.publisher |
INST ENGINEERING TECHNOLOGY-IET |
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dc.title |
Modelling of band-to-band tunnelling in silicon-on-insulator transistor with degenerately doped floating body |
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dc.type |
Article |
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dc.description.journalRegisteredClass |
scopus |
- |