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- Lee, Chang Young
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.assignee | 울산과학기술원 / 이노플라즈텍 | - |
| dc.contributor.author | 이덕연 | - |
| dc.contributor.author | 이창영 | - |
| dc.contributor.author | 정만기 | - |
| dc.contributor.author | 곽재원 | - |
| dc.contributor.author | 김경환 | - |
| dc.contributor.author | 김상진 | - |
| dc.contributor.author | 이수민 | - |
| dc.date.accessioned | 2024-01-23T17:10:04Z | - |
| dc.date.application | 2022-05-25 | - |
| dc.date.available | 2024-01-23T17:10:04Z | - |
| dc.date.registration | 2022-07-01 | - |
| dc.identifier.patentApplicationNumber | 10-2022-0064042 | - |
| dc.identifier.patentRegistrationNumber | 10-2417624 | - |
| dc.identifier.uri | https://scholarworks.unist.ac.kr/handle/201301/68628 | - |
| dc.title | 평판형 필터 전극을 이용한 분말 표면처리용 플라즈마 장치 | - |
| dc.type | Patent | - |
| dc.type.iprs | 특허 | - |
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