Full metadata record
DC Field | Value | Language |
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dc.citation.number | 3 | - |
dc.citation.startPage | 035006 | - |
dc.citation.title | Nano Express | - |
dc.citation.volume | 4 | - |
dc.contributor.author | Kunc, J | - |
dc.contributor.author | Shestopalov, M | - |
dc.contributor.author | Jo, J | - |
dc.contributor.author | Park, Kibog | - |
dc.date.accessioned | 2024-01-03T11:35:13Z | - |
dc.date.available | 2024-01-03T11:35:13Z | - |
dc.date.created | 2024-01-03 | - |
dc.date.issued | 2023-08 | - |
dc.description.abstract | Wet etching of gold on graphene is challenging due to the weak adhesion of the resist mask to graphene. We report an operating procedure for alkali ion-free wet etching of gold on graphene using a mixture of hydrochloric and nitric acids (aqua regia) with a high lateral resolution down to 100 nm. We investigate the role of positive and negative resists, electron beam lithography (EBL) dose, hard-bake, oxygen etching, aging, and sensitivity to the etch parameters, such as the freshness of dilute aqua regia, etch time, and the order of etched samples. The negative-tone resist provides the best results. The over-dosed EBL exposure can enhance the resist adhesion, as hard-bake below the glass-transition temperature and well-defined wet etch of the resist-residua-free gold surface. We also present a cleaning procedure to avoid bubble formation after the hard bake. Our results demonstrate that wet etching of gold on graphene using aqua regia is a viable method for achieving high-quality resist-free graphene surfaces. This method has potential applications in graphene nanoelectronics and nanophotonics, where high-quality graphene surfaces are essential for device performance. | - |
dc.identifier.bibliographicCitation | Nano Express, v.4, no.3, pp.035006 | - |
dc.identifier.doi | 10.1088/2632-959x/acef45 | - |
dc.identifier.issn | 2632-959X | - |
dc.identifier.scopusid | 2-s2.0-85169977970 | - |
dc.identifier.uri | https://scholarworks.unist.ac.kr/handle/201301/66470 | - |
dc.language | 영어 | - |
dc.publisher | IOP Publishing | - |
dc.title | Wet etching of gold on graphene for high-quality resist-free graphene surfaces | - |
dc.type | Article | - |
dc.description.isOpenAccess | TRUE | - |
dc.description.journalRegisteredClass | scopus | - |
dc.subject.keywordAuthor | aqua regia wet etch | - |
dc.subject.keywordAuthor | bubble formation and elimination | - |
dc.subject.keywordAuthor | hard-bake | - |
dc.subject.keywordAuthor | over-exposure | - |
dc.subject.keywordAuthor | post-development bake | - |
dc.subject.keywordAuthor | resist adhesion enhancement | - |
dc.subject.keywordAuthor | wet etching of gold on graphene | - |
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