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박수진

Park, Soojin
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dc.citation.endPage 685 -
dc.citation.number 4 -
dc.citation.startPage 681 -
dc.citation.title ADVANCED MATERIALS -
dc.citation.volume 20 -
dc.contributor.author Park, Soojin -
dc.contributor.author Kim, Bokyung -
dc.contributor.author Wang, Jia-Yu -
dc.contributor.author Russell, Thomas P. -
dc.date.accessioned 2023-12-22T08:45:47Z -
dc.date.available 2023-12-22T08:45:47Z -
dc.date.created 2014-09-26 -
dc.date.issued 2008-02 -
dc.description.abstract A general route to fabricate highly ordered arrays of nanoscopic silicon oxide dots and stripes (see figure) from block copolymer thin films is described. Poly (styrene-b-4-vinylpyridine) thin films with cylindrical microdomains oriented normal and parallel to the surface were used as templates for the fabrication of nanoscopic silicon oxide, with polydimethylsiloxane as the inorganic precursor. -
dc.identifier.bibliographicCitation ADVANCED MATERIALS, v.20, no.4, pp.681 - 685 -
dc.identifier.doi 10.1002/adma.200701997 -
dc.identifier.issn 0935-9648 -
dc.identifier.scopusid 2-s2.0-47349083542 -
dc.identifier.uri https://scholarworks.unist.ac.kr/handle/201301/6472 -
dc.identifier.url http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=47349083542 -
dc.identifier.wosid 000253741400002 -
dc.language 영어 -
dc.publisher WILEY-V C H VERLAG GMBH -
dc.title Fabrication of highly ordered silicon oxide dots and stripes from block copolymer thin films -
dc.type Article -
dc.description.journalRegisteredClass scopus -

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