dc.citation.endPage |
685 |
- |
dc.citation.number |
4 |
- |
dc.citation.startPage |
681 |
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dc.citation.title |
ADVANCED MATERIALS |
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dc.citation.volume |
20 |
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dc.contributor.author |
Park, Soojin |
- |
dc.contributor.author |
Kim, Bokyung |
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dc.contributor.author |
Wang, Jia-Yu |
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dc.contributor.author |
Russell, Thomas P. |
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dc.date.accessioned |
2023-12-22T08:45:47Z |
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dc.date.available |
2023-12-22T08:45:47Z |
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dc.date.created |
2014-09-26 |
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dc.date.issued |
2008-02 |
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dc.description.abstract |
A general route to fabricate highly ordered arrays of nanoscopic silicon oxide dots and stripes (see figure) from block copolymer thin films is described. Poly (styrene-b-4-vinylpyridine) thin films with cylindrical microdomains oriented normal and parallel to the surface were used as templates for the fabrication of nanoscopic silicon oxide, with polydimethylsiloxane as the inorganic precursor. |
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dc.identifier.bibliographicCitation |
ADVANCED MATERIALS, v.20, no.4, pp.681 - 685 |
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dc.identifier.doi |
10.1002/adma.200701997 |
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dc.identifier.issn |
0935-9648 |
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dc.identifier.scopusid |
2-s2.0-47349083542 |
- |
dc.identifier.uri |
https://scholarworks.unist.ac.kr/handle/201301/6472 |
- |
dc.identifier.url |
http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=47349083542 |
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dc.identifier.wosid |
000253741400002 |
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dc.language |
영어 |
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dc.publisher |
WILEY-V C H VERLAG GMBH |
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dc.title |
Fabrication of highly ordered silicon oxide dots and stripes from block copolymer thin films |
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dc.type |
Article |
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dc.description.journalRegisteredClass |
scopus |
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