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DC Field | Value | Language |
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dc.citation.endPage | 31663 | - |
dc.citation.number | 26 | - |
dc.citation.startPage | 31652 | - |
dc.citation.title | ACS APPLIED MATERIALS & INTERFACES | - |
dc.citation.volume | 15 | - |
dc.contributor.author | Kim, Dong-Gyu | - |
dc.contributor.author | Choi, Hyuk | - |
dc.contributor.author | Kim, Yoon-Seo | - |
dc.contributor.author | Lee, Dong-Hyeon | - |
dc.contributor.author | Oh, Hye-Jin | - |
dc.contributor.author | Lee, Ju Hyeok | - |
dc.contributor.author | Kim, Junghwan | - |
dc.contributor.author | Lee, Seunghee | - |
dc.contributor.author | Kuh, Bongjin | - |
dc.contributor.author | Kim, Taewon | - |
dc.contributor.author | Kim, Hyun You | - |
dc.contributor.author | Park, Jin-Seong | - |
dc.date.accessioned | 2023-12-21T11:53:51Z | - |
dc.date.available | 2023-12-21T11:53:51Z | - |
dc.date.created | 2023-06-25 | - |
dc.date.issued | 2023-07 | - |
dc.description.abstract | Achieving high mobility and reliability in atomic layer deposition (ALD)-based IGZO thin-film transistors (TFTs) with an amorphous phase is vital for practical applications in relevant fields. Here, we suggest a method to effectively increase stability while maintaining high mobility by employing the selective application of nitrous oxide plasma reactant during plasma-enhanced ALD (PEALD) at 200 °C process temperature. The nitrogen-doping mechanism is highly dependent on the intrinsic carbon impurities or nature of each cation, as demonstrated by a combination of theoretical and experimental research. The Ga2O3 subgap states are especially dependent on plasma reactants. Based on these insights, we can obtain high-performance indium-rich PEALD-IGZO TFTs (threshold voltage: −0.47 V; field-effect mobility: 106.5 cm2/(V s); subthreshold swing: 113.5 mV/decade; hysteresis: 0.05 V). In addition, the device shows minimal threshold voltage shifts of +0.45 and −0.10 V under harsh positive/negative bias temperature stress environments (field stress: ±2 MV/cm; temperature stress: 95 °C) after 10000 s. | - |
dc.identifier.bibliographicCitation | ACS APPLIED MATERIALS & INTERFACES, v.15, no.26, pp.31652 - 31663 | - |
dc.identifier.doi | 10.1021/acsami.3c05678 | - |
dc.identifier.issn | 1944-8244 | - |
dc.identifier.scopusid | 2-s2.0-85164238489 | - |
dc.identifier.uri | https://scholarworks.unist.ac.kr/handle/201301/64715 | - |
dc.identifier.wosid | 001015999000001 | - |
dc.language | 영어 | - |
dc.publisher | American Chemical Society | - |
dc.title | Selectively Nitrogen Doped ALD-IGZO TFTs with Extremely High Mobility and Reliability | - |
dc.type | Article | - |
dc.description.isOpenAccess | FALSE | - |
dc.relation.journalWebOfScienceCategory | Nanoscience & Nanotechnology;Materials Science, Multidisciplinary | - |
dc.relation.journalResearchArea | Science & Technology - Other Topics;Materials Science | - |
dc.type.docType | Article | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.subject.keywordAuthor | atomic layer deposition (ALD) | - |
dc.subject.keywordAuthor | N2O plasmareactant | - |
dc.subject.keywordAuthor | nitrogen (N) doping | - |
dc.subject.keywordAuthor | IGZO | - |
dc.subject.keywordAuthor | oxideTFT | - |
dc.subject.keywordPlus | ATOMIC LAYER DEPOSITION | - |
dc.subject.keywordPlus | AXIS-ALIGNED CRYSTALLINE | - |
dc.subject.keywordPlus | ELECTRONIC-STRUCTURE | - |
dc.subject.keywordPlus | LOW-TEMPERATURE | - |
dc.subject.keywordPlus | CAAC-IGZO | - |
dc.subject.keywordPlus | OXIDE | - |
dc.subject.keywordPlus | FILM | - |
dc.subject.keywordPlus | VOLTAGE | - |
dc.subject.keywordPlus | PLASMA | - |
dc.subject.keywordPlus | TRANSISTOR | - |
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