Material Design of p-Type Transparent Amorphous Semiconductor, Cu-Sn-I

Abstract

Transparent amorphous semiconductors (TAS) that can be fabricated at low temperature are key materials in the practical application of transparent flexible electronics. Although various n-type TAS materials with excellent performance, such as amorphous In-Ga-Zn-O (a-IGZO), are already known, no complementary p-type TAS has been realized to date. Here, a material design concept for p-type TAS materials is proposed utilizing the pseudo s-orbital nature of spatially spreading iodine 5p orbitals and amorphous Sn-containing CuI (a-CuSnI) thin film is reported as an example. The resulting a-CuSnI thin films fabricated by spin coating at low temperature (140 degrees C) have a smooth surface. The Hall mobility increases with the hole concentration and the largest mobility of approximate to 9 cm(2) V-1 s(-1) is obtained, which is comparable with that of conventional n-type TAS.