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DC Field | Value | Language |
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dc.citation.endPage | 1306 | - |
dc.citation.number | 10 | - |
dc.citation.startPage | 1302 | - |
dc.citation.title | ULTRAMICROSCOPY | - |
dc.citation.volume | 108 | - |
dc.contributor.author | Lee, Seung Woo | - |
dc.contributor.author | Shin, Yong-Beom | - |
dc.contributor.author | Jeon, Ki Seok | - |
dc.contributor.author | Jin, Seung Min | - |
dc.contributor.author | Suh, Yung Doug | - |
dc.contributor.author | Kim, Sanghyo | - |
dc.contributor.author | Lee, Jae Jong | - |
dc.contributor.author | Kim, Min-Gon | - |
dc.date.accessioned | 2023-12-22T08:36:43Z | - |
dc.date.available | 2023-12-22T08:36:43Z | - |
dc.date.created | 2022-01-24 | - |
dc.date.issued | 2008-09 | - |
dc.description.abstract | This paper documents a study of an Au nano-dot array that was fabricated by electron beam lithography oil a glass wafer. The patterns that had features of 100 rim dots in diameter with a 2-mu m pitch comprised a total area of 200 x 200 mu m(2). The dot-shaped Cr underlayer was open to the air after developing Poly(methyl methacrylate) (PMMA). When dipped into the Cr etchant, the exposed Cr layer was eliminated from the glass wafer in a short period of time. In order to ultimately fabricate the Ti/Au dot arrays, Ti and Au were deposited onto the arrays with a thickness of 2 and 40 nm, respectively. The lift off procedure was carried out in the Cr etchant using sonication in order to completely remove the residual Cr/PMMA layer. The fabricated Au nano-dot array was then immersed in an Ag enhancing solution and then into an ethanol solution containing (N-(6-(Biotinamido)hexyl)-3'-(2'-pyridyldithio)-propionamide (Biotin-HPDP). The substrate was analyzed using a correlated atomic force microscopy (AFM) and confocal Raman spectroscopy. Through this procedure, position-dependent surface-enhanced Raman spectroscopy (SERS) signals could be obtained. (C) 2008 Elsevier B.V. All rights reserved. | - |
dc.identifier.bibliographicCitation | ULTRAMICROSCOPY, v.108, no.10, pp.1302 - 1306 | - |
dc.identifier.doi | 10.1016/j.ultramic.2008.04.056 | - |
dc.identifier.issn | 0304-3991 | - |
dc.identifier.scopusid | 2-s2.0-49949106799 | - |
dc.identifier.uri | https://scholarworks.unist.ac.kr/handle/201301/58783 | - |
dc.identifier.url | https://www.sciencedirect.com/science/article/pii/S0304399108001277?via%3Dihub | - |
dc.identifier.wosid | 000259728000064 | - |
dc.language | 영어 | - |
dc.publisher | ELSEVIER | - |
dc.title | Electron beam lithography-assisted fabrication of Au nano-dot array as a substrate of a correlated AFM and confocal Raman spectroscopy | - |
dc.type | Article | - |
dc.description.isOpenAccess | FALSE | - |
dc.relation.journalWebOfScienceCategory | Microscopy | - |
dc.relation.journalResearchArea | Microscopy | - |
dc.type.docType | Article; Proceedings Paper | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.subject.keywordAuthor | nanoparticle | - |
dc.subject.keywordAuthor | atomic force microscopy | - |
dc.subject.keywordAuthor | surface-enhanced Raman scattering | - |
dc.subject.keywordAuthor | confocal Raman | - |
dc.subject.keywordAuthor | electron beam | - |
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