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DC Field | Value | Language |
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dc.citation.endPage | 3885 | - |
dc.citation.number | 17 | - |
dc.citation.startPage | 3878 | - |
dc.citation.title | JOURNAL OF PHYSICAL CHEMISTRY LETTERS | - |
dc.citation.volume | 13 | - |
dc.contributor.author | Zhang, Hemin | - |
dc.contributor.author | Ahn, Chang Won | - |
dc.contributor.author | Park, Jin Yong | - |
dc.contributor.author | Ok, Jung-Woo | - |
dc.contributor.author | Sung, Ji Yeong | - |
dc.contributor.author | Jin, Jong Sung | - |
dc.contributor.author | Kim, Hyun Gyu | - |
dc.contributor.author | Lee, Jae Sung | - |
dc.date.accessioned | 2023-12-21T14:11:09Z | - |
dc.date.available | 2023-12-21T14:11:09Z | - |
dc.date.created | 2022-06-14 | - |
dc.date.issued | 2022-05 | - |
dc.description.abstract | In order to recover the damaged structure of a nitrogen-implanted TiO2 photoanode, hybrid microwave annealing (HMA) is proposed as an alternative postannealing process instead of conventional thermal annealing (CTA). Compared to CTA, HMA provides distinctive advantages: (i) facile transformation of the interstitial N-N states into substitutional N-Ti states, (ii) better preservation of the ion-implanted nitrogen in TiO2, and (iii) effective alleviation of lattice strain and reconstruction of the broken bonds. As a result, the HMA-activated photoanode improves the photocurrent density by a factor of similar to 3.2 from 0.29 to 0.93 mA cm(-2 )at 1.23 V-RHE and the incident photon-to-current conversion efficiency (IPCE) from similar to 2.9% to similar to 10.5% at 430 nm relative to those of the as-prepared N-I-TiO2 photoanode in photoelectrochemical water oxidation, which are much better than those of the CTA-activated photoanode (0.58 mA cm(-2) at 1.23 V-RHE and IPCE of 5.7% at 430 nm), especially in the visible light region >= 420 nm). | - |
dc.identifier.bibliographicCitation | JOURNAL OF PHYSICAL CHEMISTRY LETTERS, v.13, no.17, pp.3878 - 3885 | - |
dc.identifier.doi | 10.1021/acs.jpclett.2c00220 | - |
dc.identifier.issn | 1948-7185 | - |
dc.identifier.scopusid | 2-s2.0-85129299777 | - |
dc.identifier.uri | https://scholarworks.unist.ac.kr/handle/201301/58690 | - |
dc.identifier.url | https://pubs.acs.org/doi/10.1021/acs.jpclett.2c00220 | - |
dc.identifier.wosid | 000799352500015 | - |
dc.language | 영어 | - |
dc.publisher | AMER CHEMICAL SOC | - |
dc.title | Healing Ion-Implanted Semiconductors by Hybrid Microwave Annealing: Activation of Nitrogen-Implanted TiO2 | - |
dc.type | Article | - |
dc.description.isOpenAccess | FALSE | - |
dc.relation.journalWebOfScienceCategory | Chemistry, Physical;Nanoscience & Nanotechnology;Materials Science, Multidisciplinary;Physics, Atomic, Molecular & Chemical | - |
dc.relation.journalResearchArea | Chemistry;Science & Technology - Other Topics;Materials Science;Physics | - |
dc.type.docType | Article | - |
dc.description.journalRegisteredClass | scie | - |
dc.subject.keywordPlus | SURFACE | - |
dc.subject.keywordPlus | PHOTOCATALYST | - |
dc.subject.keywordPlus | PERFORMANCE | - |
dc.subject.keywordPlus | TITANIUM | - |
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