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Jeong, Changwook
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dc.citation.conferencePlace FR -
dc.citation.conferencePlace Grenoble -
dc.citation.endPage 516 -
dc.citation.startPage 513 -
dc.citation.title 35th European Solid-State Device Research Conference -
dc.contributor.author Song, Y. J. -
dc.contributor.author Park, J. H. -
dc.contributor.author Lee, S. Y. -
dc.contributor.author Park, Jae-Hyun -
dc.contributor.author Hwang, Y. N. -
dc.contributor.author Lee, S. H. -
dc.contributor.author Ryoo, K. C. -
dc.contributor.author Ahn, S. J. -
dc.contributor.author Jeong, Changwook -
dc.contributor.author Shin, J. M. -
dc.contributor.author Jeong, W. C. -
dc.contributor.author Koh, K. H. -
dc.contributor.author Jeong, G. T. -
dc.contributor.author Jeong, H. S. -
dc.contributor.author Kim, K. N. -
dc.date.accessioned 2023-12-20T05:36:09Z -
dc.date.available 2023-12-20T05:36:09Z -
dc.date.created 2022-04-07 -
dc.date.issued 2005-09-12 -
dc.description.abstract Advanced bottom electrode contact (BEC) scheme was successfully developed for fabricating reliable high density 64 Mb PRAM by using ring type contact scheme. This advanced ring type BEC scheme was prepared by depositing very thin TiN films inside a contact hole, and then core dielectrics was uniformly filled into the TiN-deposited contact hole. Using this novel contact scheme, it was possible to reduce a reset current with low set resistance, and also maintain a uniform cell distribution. Thus, it is clearly demonstrated that the ring type BEC technology can exhibit strong feasibility of high density 256 Mb PRAM and beyond. -
dc.identifier.bibliographicCitation 35th European Solid-State Device Research Conference, pp.513 - 516 -
dc.identifier.doi 10.1109/ESSDER.2005.1546697 -
dc.identifier.scopusid 2-s2.0-33751417319 -
dc.identifier.uri https://scholarworks.unist.ac.kr/handle/201301/58536 -
dc.language 영어 -
dc.publisher ESSDERC 2005 -
dc.title Advanced ring type contact technology for high density phase change memory -
dc.type Conference Paper -
dc.date.conferenceDate 2005-09-12 -

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