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DC Field | Value | Language |
---|---|---|
dc.citation.number | 9 | - |
dc.citation.title | JOURNAL OF APPLIED PHYSICS | - |
dc.citation.volume | 111 | - |
dc.contributor.author | Jeong, Changwook | - |
dc.contributor.author | Datta, Supriyo | - |
dc.contributor.author | Lundstrom, Mark | - |
dc.date.accessioned | 2023-12-22T05:08:52Z | - |
dc.date.available | 2023-12-22T05:08:52Z | - |
dc.date.created | 2022-04-01 | - |
dc.date.issued | 2012-05 | - |
dc.description.abstract | The question of what fraction of the total heat flow is transported by phonons with different mean-free-paths is addressed using a Landauer approach with a full dispersion description of phonons to evaluate the thermal conductivities of bulk and thin film silicon. For bulk Si, the results reproduce those of a recent molecular dynamic treatment showing that about 50% of the heat conduction is carried by phonons with a mean-free-path greater than about 1 mu m. For the in-plane thermal conductivity of thin Si films, we find that about 50% of the heat is carried by phonons with mean-free-paths shorter than in the bulk. When the film thickness is smaller than similar to 0.2 mu m, 50% of the heat is carried by phonons with mean-free-paths longer than the film thickness. The cross-plane thermal conductivity of thin-films, where quasi-ballistic phonon transport becomes important, is also examined. For ballistic transport, the results reduce to the well-known Casimir limit [H. B. G. Casimir, Physica 5, 495-500 (1938)]. These results shed light on phonon transport in bulk and thin-film silicon and demonstrate that the Landauer approach provides a relatively simple but accurate technique to treat phonon transport from the ballistic to diffusive regimes. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4710993] | - |
dc.identifier.bibliographicCitation | JOURNAL OF APPLIED PHYSICS, v.111, no.9 | - |
dc.identifier.doi | 10.1063/1.4710993 | - |
dc.identifier.issn | 0021-8979 | - |
dc.identifier.scopusid | 2-s2.0-84864254611 | - |
dc.identifier.uri | https://scholarworks.unist.ac.kr/handle/201301/58474 | - |
dc.identifier.wosid | 000304109900057 | - |
dc.language | 영어 | - |
dc.publisher | AMER INST PHYSICS | - |
dc.title | Thermal conductivity of bulk and thin-film silicon: A Landauer approach | - |
dc.type | Article | - |
dc.description.isOpenAccess | FALSE | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.relation.journalResearchArea | Physics | - |
dc.type.docType | Article | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.subject.keywordPlus | SCATTERING | - |
dc.subject.keywordPlus | LAYERS | - |
dc.subject.keywordPlus | MODEL | - |
dc.subject.keywordPlus | HEAT | - |
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