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DC Field | Value | Language |
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dc.citation.endPage | 2187 | - |
dc.citation.number | 10 | - |
dc.citation.startPage | 2181 | - |
dc.citation.title | BIOSENSORS & BIOELECTRONICS | - |
dc.citation.volume | 20 | - |
dc.contributor.author | Wang, CL | - |
dc.contributor.author | Madou, Mark | - |
dc.date.accessioned | 2023-12-22T10:37:21Z | - |
dc.date.available | 2023-12-22T10:37:21Z | - |
dc.date.created | 2014-08-29 | - |
dc.date.issued | 2005-04 | - |
dc.description.abstract | Our work in carbon-microelectromechanical systems (C-MEMS) suggests that C-MEMS might provide a very interesting material and microfabrication approach to battery miniaturization, active DNA arrays and a wide variety of chemical and biological sensors. In C-MEMS, photoresist is patterned by photolithography and subsequently pyrolyzed at high-temperatures in an oxygen-free environment. We established that it is possible to use C-MEMS to create very high-aspect ratio carbon structures (e.g. posts with an aspect ratio >10), suspended carbon plates and suspended carbon nanowires (C-NEMS). By changing the lithography conditions, soft and hard baking times and temperatures, additives to the resist, pyrolysis time, temperature and environment, C-MEMS permits a wide variety of interesting new MEMS and NEMS applications that employ structures having a wide variety of shapes, resistivities and mechanical properties. We also demonstrate that arrays of high-aspect ratio carbon posts can be charged/discharged with Li and this enables the fabrication of a smart switchable array of batteries. | - |
dc.identifier.bibliographicCitation | BIOSENSORS & BIOELECTRONICS, v.20, no.10, pp.2181 - 2187 | - |
dc.identifier.doi | 10.1016/j.bios.2004.09.034 | - |
dc.identifier.issn | 0956-5663 | - |
dc.identifier.scopusid | 2-s2.0-14644442288 | - |
dc.identifier.uri | https://scholarworks.unist.ac.kr/handle/201301/5761 | - |
dc.identifier.url | http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=14644442288 | - |
dc.identifier.wosid | 000227845700042 | - |
dc.language | 영어 | - |
dc.publisher | ELSEVIER ADVANCED TECHNOLOGY | - |
dc.title | From MEMS to NEMS with carbon | - |
dc.type | Article | - |
dc.description.journalRegisteredClass | scopus | - |
dc.subject.keywordAuthor | carbon-microclectromechanical system (C-MEMS) | - |
dc.subject.keywordAuthor | photoresist | - |
dc.subject.keywordAuthor | pyrolysis | - |
dc.subject.keywordAuthor | high-aspect ratio | - |
dc.subject.keywordAuthor | suspended structure | - |
dc.subject.keywordPlus | PYROLYZED PHOTORESIST | - |
dc.subject.keywordPlus | GLASSY-CARBON | - |
dc.subject.keywordPlus | C-MEMS | - |
dc.subject.keywordPlus | FILMS | - |
dc.subject.keywordPlus | FABRICATION | - |
dc.subject.keywordPlus | REDUCTION | - |
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