File Download
There are no files associated with this item.
SFX Link
- Find it @ UNIST can give you direct access to the published full text of this article. (UNISTARs only)
- Ruoff, Rodney S.
Views & Downloads
Detailed Information
Cited time in 
Cited time in 
Cited time in
Metadata Downloads
Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.citation.endPage | 195 | - |
| dc.citation.number | 2 | - |
| dc.citation.startPage | 193 | - |
| dc.citation.title | APPLIED PHYSICS LETTERS | - |
| dc.citation.volume | 75 | - |
| dc.contributor.author | Lu, XK | - |
| dc.contributor.author | Huang, H | - |
| dc.contributor.author | Nemchuk, N | - |
| dc.contributor.author | Ruoff, RS | - |
| dc.date.accessioned | 2023-12-22T12:10:50Z | - |
| dc.date.available | 2023-12-22T12:10:50Z | - |
| dc.date.created | 2021-10-19 | - |
| dc.date.issued | 1999-07 | - |
| dc.description.abstract | Patterning of highly oriented pyrolytic graphite (HOPG) was demonstrated by oxygen plasma etching of lithographically patterned substrates. Periodic arrays of islands, or holes of several microns on an edge, were obtained on freshly cleaved HOPG surfaces which had been prepared with SiO2 mask stops and then oxygen plasma etched. The etching process is described, including a study of etch rate as a function of rf power, and morphology was characterized with scanning electron microscopy. | - |
| dc.identifier.bibliographicCitation | APPLIED PHYSICS LETTERS, v.75, no.2, pp.193 - 195 | - |
| dc.identifier.doi | 10.1063/1.124316 | - |
| dc.identifier.issn | 0003-6951 | - |
| dc.identifier.scopusid | 2-s2.0-0000313543 | - |
| dc.identifier.uri | https://scholarworks.unist.ac.kr/handle/201301/54524 | - |
| dc.identifier.url | https://aip.scitation.org/doi/10.1063/1.124316 | - |
| dc.identifier.wosid | 000081265200015 | - |
| dc.language | 영어 | - |
| dc.publisher | AMER INST PHYSICS | - |
| dc.title | Patterning of highly oriented pyrolytic graphite by oxygen plasma etching | - |
| dc.type | Article | - |
| dc.description.isOpenAccess | FALSE | - |
| dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
| dc.relation.journalResearchArea | Physics | - |
| dc.type.docType | Article | - |
| dc.description.journalRegisteredClass | scie | - |
| dc.description.journalRegisteredClass | scopus | - |
| dc.subject.keywordPlus | MICROSCOPE | - |
Items in Repository are protected by copyright, with all rights reserved, unless otherwise indicated.