AdPOC and t-AdOC as new deprotecting group in photoresist material

Abstract

t-Butyloxycarbonyl group(t-BOC) is a well known deprotecting group in photoresist material because of its easily cleavable characteristics and high thermal stability. 1-Adamantyloxycarbonyl(t-AdOC) and 1-(1-adamantyl)-1-methylethoxy carbonyl(AdPOC) groups can be cleaved much faster than t-BOC group in room temperature and mild acidolytic condition. We introduce the t-AdOC and AdPOC groups as new debloking groups instead of t-BOC group in photoresist material. In this research we will describe the possibility of these groups as novel deblocking groups and will show the characteristics such as thermal stability, UV absorbance, and the performance of the photoresist by using these groups