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Park, Kibog
Emergent Materials & Devices Lab.
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dc.citation.conferencePlace US -
dc.citation.conferencePlace Richardson, TX; United States -
dc.citation.endPage 284 -
dc.citation.startPage 280 -
dc.citation.title International Conference on Characterization and Metrology for ULSI Technology -
dc.citation.volume 788 -
dc.contributor.author Tivarus, C -
dc.contributor.author Park, Kibog -
dc.contributor.author Hudait, M.K. -
dc.contributor.author Ringel, S.A. -
dc.contributor.author Pelz, J.P. -
dc.date.accessioned 2023-12-20T05:37:08Z -
dc.date.available 2023-12-20T05:37:08Z -
dc.date.created 2014-12-23 -
dc.date.issued 2005-03-15 -
dc.description.abstract Ballistic Electron Emission Microscopy (BEEM) and finite-element electrostatic modeling were used to quantify how "small-size" effects modify the energy barrier at metal/semiconductor nanostructure nanocontacts, formed by making Schottky contacts to cleaved edges of GaAs quantum wells (QWs). The Schottky barrier height over the QWs was found to systematically increase with decreasing QW width, by up to ∼140 meV for a 1nm QW. This is mostly due to a large quantum-confinement increase (∼200 meV for a 1nm QW), modified by smaller decreases due to "environmental" electric field effects. Our modeling gives excellent quantitative agreement with measurements for a wide range of QW widths when both quantum confinement and environmental electric fields are considered. -
dc.identifier.bibliographicCitation International Conference on Characterization and Metrology for ULSI Technology, v.788, pp.280 - 284 -
dc.identifier.doi 10.1063/1.2062977 -
dc.identifier.isbn 0735402779;978-07354 -
dc.identifier.issn 0094-243X -
dc.identifier.uri https://scholarworks.unist.ac.kr/handle/201301/52063 -
dc.publisher AIP Conference Proceedings -
dc.title.alternative Nanoscale characterization of metal/semiconductor nanocontacts -
dc.title Nanoscale characterization of metal/semiconductor nanocontacts -
dc.type Conference Paper -
dc.date.conferenceDate 2005-03-15 -

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