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- Kim, Kyung Rok
- Nano-Electronic Emerging Devices Lab.
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| DC Field | Value | Language |
|---|---|---|
| dc.citation.conferencePlace | JA | - |
| dc.citation.title | International Microprocesses and Nanotechnology Conference | - |
| dc.contributor.author | Kim, Kyung Rok | - |
| dc.date.accessioned | 2023-12-19T23:08:19Z | - |
| dc.date.available | 2023-12-19T23:08:19Z | - |
| dc.date.created | 2015-07-01 | - |
| dc.date.issued | 2014-11-07 | - |
| dc.identifier.bibliographicCitation | International Microprocesses and Nanotechnology Conference | - |
| dc.identifier.uri | https://scholarworks.unist.ac.kr/handle/201301/50876 | - |
| dc.publisher | The Japan Society of Applied Physics | - |
| dc.title | Investigation of Gate-Induced Drain Leakage Suppression by Fringing Field in High-k/Metal Gate CMOS Technology | - |
| dc.type | Conference Paper | - |
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