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DC Field | Value | Language |
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dc.citation.endPage | 5781 | - |
dc.citation.number | 4 | - |
dc.citation.startPage | 5772 | - |
dc.citation.title | ACS APPLIED MATERIALS & INTERFACES | - |
dc.citation.volume | 13 | - |
dc.contributor.author | Kim, Dong Hyup | - |
dc.contributor.author | Suh, Ahram | - |
dc.contributor.author | Park, Geonhyeong | - |
dc.contributor.author | Yoon, Dong Ki | - |
dc.contributor.author | Kim, So Youn | - |
dc.date.accessioned | 2023-12-21T16:15:03Z | - |
dc.date.available | 2023-12-21T16:15:03Z | - |
dc.date.created | 2021-03-25 | - |
dc.date.issued | 2021-02 | - |
dc.description.abstract | Directed self-assembly (DSA) of block copolymer (BCP) thin films is of particular interest in nanoscience and nanotechnology due to its superior ability to form various well-aligned nanopatterns. Herein, nanoscratch-DSA is introduced as a simple and scalable DSA strategy allowing highly aligned BCP nanopatterns over a large area. A gentle scratching on the target substrate with a commercial diamond lapping film can form uniaxially aligned nanoscratches. As applied in BCP thin films, the nanoscratch effectively guides the self-assembly of overlying BCPs and provides highly aligned nanopatterns along the direction of the nanoscratch. The nanoscratch-DSA is not material-specific, allowing more versatile nanofabrication for various functional nanomaterials. In addition, we demonstrate that the nanoscratch-DSA can be utilized as a direction-controllable and area-selective nanofabrication method. | - |
dc.identifier.bibliographicCitation | ACS APPLIED MATERIALS & INTERFACES, v.13, no.4, pp.5772 - 5781 | - |
dc.identifier.doi | 10.1021/acsami.0c19665 | - |
dc.identifier.issn | 1944-8244 | - |
dc.identifier.scopusid | 2-s2.0-85100260690 | - |
dc.identifier.uri | https://scholarworks.unist.ac.kr/handle/201301/50574 | - |
dc.identifier.url | https://pubs.acs.org/doi/10.1021/acsami.0c19665 | - |
dc.identifier.wosid | 000618153100098 | - |
dc.language | 영어 | - |
dc.publisher | AMER CHEMICAL SOC | - |
dc.title | Nanoscratch-Directed Self-Assembly of Block Copolymer Thin Films | - |
dc.type | Article | - |
dc.description.isOpenAccess | FALSE | - |
dc.relation.journalWebOfScienceCategory | Nanoscience & Nanotechnology; Materials Science, Multidisciplinary | - |
dc.relation.journalResearchArea | Science & Technology - Other Topics; Materials Science | - |
dc.type.docType | Article | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.subject.keywordAuthor | block copolymers | - |
dc.subject.keywordAuthor | self-assembly | - |
dc.subject.keywordAuthor | thin films | - |
dc.subject.keywordAuthor | directed self-assembly | - |
dc.subject.keywordAuthor | nanopatterning | - |
dc.subject.keywordAuthor | nanoscratch | - |
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