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윤태식

Yoon, Tae-Sik
Nano Semiconductor Research Lab.
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dc.citation.endPage 287 -
dc.citation.number 8 -
dc.citation.startPage 281 -
dc.citation.title ECS Transactions -
dc.citation.volume 50 -
dc.contributor.author Lee, S.C. -
dc.contributor.author Hu, Q. -
dc.contributor.author Lee, J.Y. -
dc.contributor.author Baek, Y.-J. -
dc.contributor.author Lee, H.H. -
dc.contributor.author Yoon, Tae-Sik -
dc.date.accessioned 2023-12-22T04:38:51Z -
dc.date.available 2023-12-22T04:38:51Z -
dc.date.created 2021-03-08 -
dc.date.issued 2012-10 -
dc.description.abstract A nanocrystal (NC) floating gate memory with colloidal Pt-Fe 2O3 core-shell NCs with indium gallium zinc oxide (IGZO) channel was fabricated. The Pt core and Fe2O3 shell in NC play a role of charge storage node and thin tunneling dielectric, respectively. The NCs layer was formed on SiO2(control oxide, 30nm)/n+-Si bottom gate by solution-based dip-coating process. Then, the IGZO channel was prepared by rf magnetron sputtering at room temperature. The NC floating gate memory exhibited the threshold voltage shift up to 1.67 V at gate pulsing 20 V, demonstrating the feasibility of employing colloidal core-shell NCs in gate stack of NC floating gate memory. © The Electrochemical Society. -
dc.identifier.bibliographicCitation ECS Transactions, v.50, no.8, pp.281 - 287 -
dc.identifier.doi 10.1149/05008.0281ecst -
dc.identifier.issn 1938-5862 -
dc.identifier.scopusid 2-s2.0-84885750790 -
dc.identifier.uri https://scholarworks.unist.ac.kr/handle/201301/50257 -
dc.language 영어 -
dc.publisher ECS -
dc.title Nanocrystal floating gate memory with indium gallium zinc oxide channel and Pt- Fe2O3 core-shell nanocrystals -
dc.type Article -
dc.description.isOpenAccess FALSE -
dc.type.docType Conference Paper -
dc.description.journalRegisteredClass scopus -
dc.subject.keywordPlus Core-Shell Nanocrystals -
dc.subject.keywordPlus Dip-coating process -
dc.subject.keywordPlus Floating gate memory -
dc.subject.keywordPlus Indium gallium zinc oxides -
dc.subject.keywordPlus Nanocrystal floating-gate memory -
dc.subject.keywordPlus rf-Magnetron sputtering -
dc.subject.keywordPlus Threshold voltage shifts -
dc.subject.keywordPlus Tunneling dielectrics -
dc.subject.keywordPlus Magnetron sputtering -
dc.subject.keywordPlus Nanocrystals -
dc.subject.keywordPlus Platinum -
dc.subject.keywordPlus Shells (structures) -
dc.subject.keywordPlus Thin film transistors -

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