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Kim, Kyung Rok
Nano-Electronic Emerging Devices Lab.
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dc.citation.conferencePlace US -
dc.citation.conferencePlace Washington, DC -
dc.citation.endPage 154 -
dc.citation.startPage 151 -
dc.citation.title IEEE International Electron Devices Meeting -
dc.contributor.author Kim, Dae Hwan -
dc.contributor.author Sung, Suk-Kang -
dc.contributor.author Kim, Kyung Rok -
dc.contributor.author Choi, Bum Ho -
dc.contributor.author Hwang, Sung Woo -
dc.contributor.author Ahn, Doyeol -
dc.contributor.author Lee, Jong Duk -
dc.contributor.author Park, Byung-Gook -
dc.date.accessioned 2023-12-20T06:10:03Z -
dc.date.available 2023-12-20T06:10:03Z -
dc.date.created 2014-12-23 -
dc.date.issued 2001-12-02 -
dc.description.abstract Si single-electron transistors with sidewall depletion gates on a silicon-on-insulator nanowire are proposed and fabricated, using the combination of the conventional lithography and process technology. The size dependence of device characteristics shows good controllability and reproducibility, and a dynamic multi-functional SET logic is successfully demonstrated at 10 K, for the first time. -
dc.identifier.bibliographicCitation IEEE International Electron Devices Meeting, pp.151 - 154 -
dc.identifier.doi 10.1109/IEDM.2001.979454 -
dc.identifier.issn 0163-1918 -
dc.identifier.scopusid 2-s2.0-0035716655 -
dc.identifier.uri https://scholarworks.unist.ac.kr/handle/201301/46633 -
dc.identifier.url https://ieeexplore.ieee.org/document/979454 -
dc.language 영어 -
dc.publisher IEEE Electron Device Society -
dc.title Si Single-Electron Transistors with Sidewall Depletion Gates and their Application to Dynamic Single-Electron Transistor Logic -
dc.type Conference Paper -
dc.date.conferenceDate 2001-12-02 -

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