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Choi, Kyoung Jin
Energy Conversion Materials Lab.
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Interpretation of Schottky Characteristics on n-type 4H-SiC treated by Cl2 Inductively Coupled Plasma

Author(s)
Choi, Kyoung Jin
Issued Date
2002-02-21
URI
https://scholarworks.unist.ac.kr/handle/201301/44399
Citation
제 9회 한국반도체 학술대회, pp.297
Publisher
한국 물리학회

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