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김재업

Kim, Jaeup U.
Nanostructured Polymer Theory Lab.
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DC Field Value Language
dc.citation.conferencePlace KO -
dc.citation.conferencePlace Jeonju -
dc.citation.endPage 526 -
dc.citation.startPage 523 -
dc.citation.title 3rd International Conference on Multi-Functional Materials and Structures, MFMS 2010 -
dc.citation.volume 123-125 -
dc.contributor.author Kim, Jaeup U. -
dc.date.accessioned 2023-12-20T03:36:34Z -
dc.date.available 2023-12-20T03:36:34Z -
dc.date.created 2013-05-24 -
dc.date.issued 2010-09-14 -
dc.description.abstract Patterned substrates are good candidates to enhance the arrangement of nanodomains in block copolymer thin films. Here, I theoretically demonstrate the possibility to self-assemble block copolymers on top of physically or chemically patterned substrates. The presence of substrate pattern not only enhances the alignment of polymers, but also induces novel new morphologies which were not present in the bulk phase diagram. -
dc.identifier.bibliographicCitation 3rd International Conference on Multi-Functional Materials and Structures, MFMS 2010, v.123-125, pp.523 - 526 -
dc.identifier.doi 10.4028/www.scientific.net/AMR.123-125.523 -
dc.identifier.isbn 978-0-87849-246-6 -
dc.identifier.issn 1022-6680 -
dc.identifier.scopusid 2-s2.0-78650743133 -
dc.identifier.uri https://scholarworks.unist.ac.kr/handle/201301/37009 -
dc.identifier.url https://www.scientific.net/AMR.123-125.523 -
dc.identifier.wosid 000289269600128 -
dc.language 영어 -
dc.publisher 3rd International Conference on Multi-Functional Materials and Structures, MFMS 2010 -
dc.title Block Copolymers on a Physically or Chemically Patterned Substrate -
dc.type Conference Paper -
dc.date.conferenceDate 2010-09-14 -

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