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DC Field | Value | Language |
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dc.citation.endPage | 1569 | - |
dc.citation.number | 10 | - |
dc.citation.startPage | 1563 | - |
dc.citation.title | SMALL | - |
dc.citation.volume | 8 | - |
dc.contributor.author | Kim, Sarah | - |
dc.contributor.author | Shin, Dong Ok | - |
dc.contributor.author | Choi, Dae-Geun | - |
dc.contributor.author | Jeong, Jong-Ryul | - |
dc.contributor.author | Mun, Jeong Ho | - |
dc.contributor.author | Yang, Yong-Biao | - |
dc.contributor.author | Kim, Jaeup U. | - |
dc.contributor.author | Kim, Sang Ouk | - |
dc.contributor.author | Jeong, Jun-Ho | - |
dc.date.accessioned | 2023-12-22T05:10:05Z | - |
dc.date.available | 2023-12-22T05:10:05Z | - |
dc.date.created | 2013-06-19 | - |
dc.date.issued | 2012-05 | - |
dc.description.abstract | A highly efficient, ultralarge-area nanaolithography that integrates block-copolymer lithography with single-step ZnO nanoimprinting is introduced. The UV-assisted imprinting of a photosensitive solgel precursor creates large-area ZnO topographic patterns with various pattern shapes in a single-step process. This straightforward approach provides a smooth line edge and high thermal stability of the imprinted ZnO pattern; these properties are greatly advantageous for further graphoepitaxial block-copolymer assembly. According to the ZnO pattern shape and depth, the orientation and lateral ordering of self-assembled cylindrical nanodomains in block-copolymer thin films could be directed in a variety of ways. Significantly, the subtle tunability of ZnO trench depth enabled by nanoimprinting, generated complex hierarchical nanopatterns, where surface-parallel and surface-perpendicular nanocylinder arrays are alternately arranged. The stability of this complex morphology is confirmed by self-consistent field theory (SCFT) calculations. The highly ordered graphoepitaxial nanoscale assembly achieved on transparent semiconducting ZnO substrates offers enormous potential for photonics and optoelectronics. | - |
dc.identifier.bibliographicCitation | SMALL, v.8, no.10, pp.1563 - 1569 | - |
dc.identifier.doi | 10.1002/smll.201101960 | - |
dc.identifier.issn | 1613-6810 | - |
dc.identifier.scopusid | 2-s2.0-84861117693 | - |
dc.identifier.uri | https://scholarworks.unist.ac.kr/handle/201301/3695 | - |
dc.identifier.url | http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=84861117693 | - |
dc.identifier.wosid | 000304001000013 | - |
dc.language | 영어 | - |
dc.publisher | WILEY-V C H VERLAG GMBH | - |
dc.title | Graphoepitaxy of Block-Copolymer Self-Assembly Integrated with Single-Step ZnO Nanoimprinting | - |
dc.type | Article | - |
dc.relation.journalWebOfScienceCategory | Chemistry, Multidisciplinary; Chemistry, Physical; Nanoscience & Nanotechnology; Materials Science, Multidisciplinary; Physics, Applied; Physics, Condensed Matter | - |
dc.relation.journalResearchArea | Chemistry; Science & Technology - Other Topics; Materials Science; Physics | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.subject.keywordAuthor | nanoimprinting | - |
dc.subject.keywordAuthor | zinc oxide (ZnO) | - |
dc.subject.keywordAuthor | self-assembly | - |
dc.subject.keywordAuthor | block copolymers | - |
dc.subject.keywordAuthor | nanopatterning | - |
dc.subject.keywordPlus | SOFT GRAPHOEPITAXY | - |
dc.subject.keywordPlus | LITHOGRAPHY | - |
dc.subject.keywordPlus | FILMS | - |
dc.subject.keywordPlus | ALIGNMENT | - |
dc.subject.keywordPlus | CONFINEMENT | - |
dc.subject.keywordPlus | RESOLUTION | - |
dc.subject.keywordPlus | TEMPLATES | - |
dc.subject.keywordPlus | PATTERNS | - |
dc.subject.keywordPlus | DENSITY | - |
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