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Shin, Hyung-Joon
Nanoscale Materials Science Lab (NMSL)
Research Interests
  • Scanning tunneling microscopy, surface science, interface science, nanomaterials


Activation of Ultrathin Oxide Films for Chemical Reaction by Interface Defects

DC Field Value Language Jung, Jaehoon ko Shin, Hyung-Joon ko Kim, Yousoo ko Kawai, Maki ko 2014-04-10T02:15:33Z - 2013-07-24 ko 2011-04 -
dc.identifier.citation JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, v.133, no.16, pp.6142 - 6145 ko
dc.identifier.issn 0002-7863 ko
dc.identifier.uri -
dc.identifier.uri ko
dc.description.abstract Periodic density functional theory calculations revealed strong enhancement of chemical reactivity by defects located at the oxide-metal interface for water dissociation on ultrathin MgO films deposited on Ag(100) substrate. Accumulation of charge density at the oxide-metal interface due to irregular interface defects influences the chemical reactivity of MgO films by changing the charge distribution at the oxide surface. Our results reveal the importance of buried interface defects in controlling chemical reactions on an ultrathin oxide film supported by a metal substrate. ko
dc.description.statementofresponsibility close -
dc.language ENG ko
dc.publisher AMER CHEMICAL SOC ko
dc.subject Ag(100) ko
dc.subject Buried interface ko
dc.subject Interface defects ko
dc.subject Metal substrate ko
dc.subject MgO films ko
dc.subject Oxide surface ko
dc.subject Oxide-metal interface ko
dc.subject Periodic density functional theory calculations ko
dc.subject Strong enhancement ko
dc.subject Ultra-thin ko
dc.subject Ultra-thin oxide films ko
dc.subject Water dissociation ko
dc.title Activation of Ultrathin Oxide Films for Chemical Reaction by Interface Defects ko
dc.type ARTICLE ko
dc.identifier.scopusid 2-s2.0-79955030526 ko
dc.identifier.wosid 000292715500012 ko
dc.type.rims ART ko
dc.description.scopustc 12 * 2014-07-12 *
dc.identifier.doi 10.1021/ja200854g ko
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