dc.citation.conferencePlace |
US |
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dc.citation.conferencePlace |
Anaheim, CA |
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dc.citation.endPage |
368 |
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dc.citation.startPage |
365 |
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dc.citation.title |
42nd Design Automation Conference, Proceedings 2005 |
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dc.contributor.author |
Gupta, P |
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dc.contributor.author |
Kahng, AB |
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dc.contributor.author |
Kim, Youngmin |
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dc.contributor.author |
Sylvester, D |
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dc.date.accessioned |
2023-12-20T05:36:30Z |
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dc.date.available |
2023-12-20T05:36:30Z |
- |
dc.date.created |
2014-11-20 |
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dc.date.issued |
2005-06-13 |
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dc.description.abstract |
Process variations have become a bottleneck for predictable and highyielding IC design and fabrication. Linewidth variation (ΔL) due to defocus in a chip is largely systematic after the layout is completed, i.e., dense lines "smile" through focus while isolated (iso) lines "frown". In this paper, we propose a design flow that allows explicit compensation of focus variation, either within a cell (self-compensated cells) or across cells in a critical path (self-compensated design). Assuming that iso and dense variants are available for each library cell, we achieve designs that are more robust to focus variation. Design with a self-compensated cell library incurs ∼11-12% area penalty while compensating for focus variation. Across-cell optimization with a mix of dense and iso cell variants incurs ∼6-8% area overhead compared to the original cell library, while meeting timing constraints across a large range of focus variation (from 0 to 0.4um). A combination of original and iso cells provides an even better self-compensating design option, with only 1% area overhead. Circuit delay distributions are tighter with self-compensated cells and self-compensated design than with a conventional design methodology. |
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dc.identifier.bibliographicCitation |
42nd Design Automation Conference, Proceedings 2005, pp.365 - 368 |
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dc.identifier.issn |
0738-100X |
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dc.identifier.scopusid |
2-s2.0-27944463118 |
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dc.identifier.uri |
https://scholarworks.unist.ac.kr/handle/201301/35823 |
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dc.language |
영어 |
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dc.publisher |
IEEE |
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dc.title |
Self-compensating design for focus variation |
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dc.type |
Conference Paper |
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dc.date.conferenceDate |
2005-06-13 |
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