Full metadata record
DC Field | Value | Language |
---|---|---|
dc.citation.number | 2 | - |
dc.citation.title | MATERIALS | - |
dc.citation.volume | 13 | - |
dc.contributor.author | Cho, Ha Ryeong | - |
dc.contributor.author | Choe, Ayoung | - |
dc.contributor.author | Park, Woon Ik | - |
dc.contributor.author | Ko, Hyunhyub | - |
dc.contributor.author | Byun, Myunghwan | - |
dc.date.accessioned | 2023-12-21T18:08:48Z | - |
dc.date.available | 2023-12-21T18:08:48Z | - |
dc.date.created | 2020-03-23 | - |
dc.date.issued | 2020-01 | - |
dc.description.abstract | A chemically defined patterned surface was created via a combined process of controlled evaporative self-assembly of concentric polymer stripes and the selective surface modification of polymer brush. The former process involved physical adsorption of poly (methyl methacrylate) (PMMA) segments into silicon oxide surface, thus forming ultrathin PMMA stripes, whereas the latter process was based on the brush treatment of silicon native oxide surface using a hydroxyl-terminated polystyrene (PS-OH). The resulting alternating PMMA- and PS-rich stripes provided energetically favorable regions for self-assembly of high |
- |
dc.identifier.bibliographicCitation | MATERIALS, v.13, no.2 | - |
dc.identifier.doi | 10.3390/ma13020304 | - |
dc.identifier.issn | 1996-1944 | - |
dc.identifier.scopusid | 2-s2.0-85079772244 | - |
dc.identifier.uri | https://scholarworks.unist.ac.kr/handle/201301/31866 | - |
dc.identifier.url | https://www.mdpi.com/1996-1944/13/2/304/htm | - |
dc.identifier.wosid | 000515499900051 | - |
dc.language | 영어 | - |
dc.publisher | MDPI | - |
dc.title | Lithography-Free Route to Hierarchical Structuring of High-chi Block Copolymers on a Gradient Patterned Surface | - |
dc.type | Article | - |
dc.description.isOpenAccess | TRUE | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.type.docType | Article | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.subject.keywordAuthor | high chi di-block copolymer | - |
dc.subject.keywordAuthor | wedge-on-Si geometry | - |
dc.subject.keywordAuthor | controlled evaporative self-assembly | - |
dc.subject.keywordAuthor | hierarchically ordered nanostructures | - |
dc.subject.keywordAuthor | gradient patterned surface | - |
dc.subject.keywordAuthor | oxide nanogroove | - |
dc.subject.keywordPlus | FLOW | - |
dc.subject.keywordPlus | RANGE | - |
dc.subject.keywordPlus | NANOSTRUCTURES | - |
dc.subject.keywordPlus | GRAPHOEPITAXY | - |
dc.subject.keywordPlus | MORPHOLOGIES | - |
dc.subject.keywordPlus | ORIENTATION | - |
dc.subject.keywordPlus | TEMPERATURE | - |
dc.subject.keywordPlus | DEPOSITION | - |
dc.subject.keywordPlus | RESOLUTION | - |
dc.subject.keywordPlus | RECOVERY | - |
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