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Park, Soojin
Nano-Functional Materials Lab
Research Interests
  • Block Copolymers, nanostructured materials for Lithium-Ion batteries, wearable and stretchable energy storage applications


Patterning of various silicon structures via polymer lithography and catalytic chemical etching

DC Field Value Language Lee, Jung-Pil ko Bang, Byoung Man ko Choi, Sinho ko Kim, Taesung ko Park, Soojin ko 2014-04-10T01:28:25Z - 2013-06-11 ko 2011-07 -
dc.identifier.citation NANOTECHNOLOGY, v.22, no.27, pp.1 - 6 ko
dc.identifier.issn 0957-4484 ko
dc.identifier.uri -
dc.identifier.uri ko
dc.description.abstract We demonstrate a facile fabrication of a rich variety of silicon patterns with different length scales by combining polymer lithography and a metal-assisted chemical etching method. Several types of polymer patterns were fabricated on silicon substrates, and silver layers were deposited on the patterned silicon surfaces and used to etch the silicon beneath. Various silicon patterns including topographic lines, concentric rings, and square arrays were created at a micro-and nanoscale after etching the silicon and subsequent removal of the patterned polymer masks. Alternatively, the arrays of sub-30 nm silicon nanowires were produced by a chemical etching of the silicon wafer which was covered with highly ordered polystyrene-block-polyvinylpyridine (PS-b-PVP) micellar films. In addition, silicon nanohole arrays were also generated by etching with hexagonally packed silver nanoparticles that were prepared using PS-b-PVP block copolymer templates. ko
dc.description.statementofresponsibility close -
dc.language ENG ko
dc.publisher IOP PUBLISHING LTD ko
dc.subject Copper pattern ko
dc.subject Current collector ko
dc.subject Electrochemical performance ko
dc.subject High rate capability ko
dc.subject Immersion process ko
dc.subject Lithium-ion battery ko
dc.subject Mechanically robust ko
dc.subject Nano-structured ko
dc.subject Reversible capacity ko
dc.subject Silicon nanoparticles ko
dc.title Patterning of various silicon structures via polymer lithography and catalytic chemical etching ko
dc.type ARTICLE ko
dc.identifier.scopusid 2-s2.0-79957862630 ko
dc.identifier.wosid 000291021200013 ko
dc.type.rims ART ko
dc.description.wostc 5 *
dc.description.scopustc 5 * 2014-10-18 * 2014-07-12 *
dc.identifier.doi 10.1088/0957-4484/22/27/275305 ko
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