Self-Assembled Copolymer Adsorption Layer-Induced Block Copolymer Nanostructures in Thin Films

Abstract

In polymer thin films, the bottom polymer chains are irreversibly adsorbed onto the substrates creating an ultrathin layer. Although this thin layer (only a few nanometers thick) governs all film properties, an understanding of this adsorbed layer remains elusive, and thus, its effective control has yet to be achieved, particularly in block copolymer (BCP) thin films. Herein, we employ self-assembled copolymer adsorption layers (SCALs), transferred from the air/water interfacial self-assembly of BCPs, as an effective control of the adsorbed layer in BCP thin films. SCALs replace the natural adsorbed layer, irreversibly adsorbing onto the substrates when other BCP is additionally coated on the SCALs. We further show that SCALs guide the thin film nanostructures because they provide topological restrictions and enthalpic/entropic preferences for a BCP self-assembly. The SCAL-induced self-assembly enables unprecedented control of nanostructures, creating novel nanopatterns such as spacing-controlled hole/dot patterns, dotted-line patterns, dash-line patterns, and anisotropic cluster patterns with exceptional controllability.