File Download

There are no files associated with this item.

  • Find it @ UNIST can give you direct access to the published full text of this article. (UNISTARs only)
Related Researcher

서준기

Suh, Joonki
Semiconductor Nanotechnology Lab.
Read More

Views & Downloads

Detailed Information

Cited time in webofscience Cited time in scopus
Metadata Downloads

Ferroelectrically Gated Atomically Thin Transition-Metal Dichalcogenides as Nonvolatile Memory

Author(s)
Ko, ChanghyunLee, YeonbaeChen, YabinSuh, JoonkiFu, DeyiSuslu, AslihanLee, SangwookClarkson, James DavidChoe, Hwan SungTongay, SefaatinRamesh, RamamoorthyWu, Junqiao
Issued Date
2016-04
DOI
10.1002/adma.201504779
URI
https://scholarworks.unist.ac.kr/handle/201301/27093
Fulltext
https://onlinelibrary.wiley.com/doi/full/10.1002/adma.201504779
Citation
ADVANCED MATERIALS, v.28, no.15, pp.2923 - 2930
Abstract
Ferroelectrically driven nonvolatile memory is demonstrated by interfacing 2D semiconductors and ferroelectric thin films, exhibiting superior memory performance comparable to existing thin-film ferroelectric field-effect transistors. An optical memory effect is also observed with large modulation of photoluminescence tuned by the ferroelectric gating, potentially finding applications in optoelectronics and valleytronics.
Publisher
WILEY-V C H VERLAG GMBH
ISSN
0935-9648
Keyword (Author)
2D materialsferroelectricsfield-effect transistorsnonvolatile memorytransition-metal dichalcogenides
Keyword
FIELD-EFFECT TRANSISTORSFEW-LAYER MOS2MOLYBDENUM-DISULFIDEHETEROSTRUCTURESFILMSPOLARIZATIONNANOSHEETWS2MODULATIONGRAPHENE

qrcode

Items in Repository are protected by copyright, with all rights reserved, unless otherwise indicated.