There are no files associated with this item.
Full metadata record
DC Field | Value | Language |
---|---|---|
dc.citation.number | 2 | - |
dc.citation.startPage | 023504 | - |
dc.citation.title | JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS | - |
dc.citation.volume | 17 | - |
dc.contributor.author | Rhie, Jiyeah | - |
dc.contributor.author | Lee, Dukhyung | - |
dc.contributor.author | Bahk, Young-Mi | - |
dc.contributor.author | Jeong, Jeeyoon | - |
dc.contributor.author | Choi, Geunchang | - |
dc.contributor.author | Lee, Youjin | - |
dc.contributor.author | Kim, Sunghwan | - |
dc.contributor.author | Hong, Seunghun | - |
dc.contributor.author | Kim, Dai-Sik | - |
dc.date.accessioned | 2023-12-21T20:48:18Z | - |
dc.date.available | 2023-12-21T20:48:18Z | - |
dc.date.created | 2019-03-11 | - |
dc.date.issued | 2018-04 | - |
dc.description.abstract | Atomic layer deposition is an efficient method for coating a few nanometer-thick alumina over a wafer scale. This method combined with the standard photolithography process was presented to fabricate metallic nanometer gaps that optically act in terahertz regimes. However, the cross-sectional view of the gap shape of the metal-insulator-metal nanogap structure varies depending on the conditions from the stepwise procedure. In specific, selecting photoresist materials, adding ion milling and chemical etching processes, and varying metal thicknesses and substrates result in various optical gap widths and shapes. Since the cross-sectional gap shape affects the field enhancement of the tunneled electromagnetic waves via the nanogap, the control of tailoring the gap shape is necessary. Thus, we present five different versions of fabricating quadrangle-ring-shaped nanometer gap arrays with varying different kinds of outcomes. We foresee the usage of the suggested category for Specific applications. (C) The Authors. Published by SPIE under a Creative Commons Attribution 3.0 Unported License Distribution or repro- | - |
dc.identifier.bibliographicCitation | JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, v.17, no.2, pp.023504 | - |
dc.identifier.doi | 10.1117/1.JMM.17.2.023504 | - |
dc.identifier.issn | 1932-5150 | - |
dc.identifier.scopusid | 2-s2.0-85047094661 | - |
dc.identifier.uri | https://scholarworks.unist.ac.kr/handle/201301/26354 | - |
dc.identifier.wosid | 000439237100006 | - |
dc.language | 영어 | - |
dc.publisher | SPIE-SOC PHOTO-OPTICAL INSTRUMENTATION ENGINEERS | - |
dc.title | Control of optical nanometer gap shapes made via standard lithography using atomic layer deposition | - |
dc.type | Article | - |
dc.description.isOpenAccess | FALSE | - |
dc.relation.journalWebOfScienceCategory | Engineering, Electrical & Electronic; Nanoscience & Nanotechnology; Materials Science, Multidisciplinary; Optics | - |
dc.relation.journalResearchArea | Engineering; Science & Technology - Other Topics; Materials Science; Optics | - |
dc.type.docType | Article | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.subject.keywordAuthor | atomic layer deposition | - |
dc.subject.keywordAuthor | standard lithography | - |
dc.subject.keywordAuthor | nanometer gap | - |
dc.subject.keywordAuthor | cross-sectional gap shape | - |
dc.subject.keywordAuthor | field enhancement | - |
dc.subject.keywordPlus | TERAHERTZ FIELD ENHANCEMENT | - |
dc.subject.keywordPlus | THIN-FILM GROWTH | - |
dc.subject.keywordPlus | HYDROGEN SILSESQUIOXANE | - |
dc.subject.keywordPlus | ARRAYS | - |
dc.subject.keywordPlus | ANTENNAS | - |
dc.subject.keywordPlus | LIGHT | - |
dc.subject.keywordPlus | METAMATERIALS | - |
dc.subject.keywordPlus | NANOPARTICLES | - |
dc.subject.keywordPlus | AG | - |
Items in Repository are protected by copyright, with all rights reserved, unless otherwise indicated.
Tel : 052-217-1404 / Email : scholarworks@unist.ac.kr
Copyright (c) 2023 by UNIST LIBRARY. All rights reserved.
ScholarWorks@UNIST was established as an OAK Project for the National Library of Korea.