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DC Field | Value | Language |
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dc.citation.startPage | 2361 | - |
dc.citation.title | NATURE COMMUNICATIONS | - |
dc.citation.volume | 4 | - |
dc.contributor.author | Chen, Xiaoshu | - |
dc.contributor.author | Park, Hyeong-Ryeol | - |
dc.contributor.author | Pelton, Matthew | - |
dc.contributor.author | Piao, Xianji | - |
dc.contributor.author | Lindquist, Nathan C. | - |
dc.contributor.author | Im, Hyungsoon | - |
dc.contributor.author | Kim, Yun Jung | - |
dc.contributor.author | Ahn, Jae Sung | - |
dc.contributor.author | Ahn, Kwang Jun | - |
dc.contributor.author | Park, Namkyoo | - |
dc.contributor.author | Kim, Dai-Sik | - |
dc.contributor.author | Oh, Sang-Hyun | - |
dc.date.accessioned | 2023-12-22T03:37:26Z | - |
dc.date.available | 2023-12-22T03:37:26Z | - |
dc.date.created | 2019-03-08 | - |
dc.date.issued | 2013-09 | - |
dc.description.abstract | Squeezing light through nanometre-wide gaps in metals can lead to extreme field enhancements, nonlocal electromagnetic effects and light-induced electron tunnelling. This intriguing regime, however, has not been readily accessible to experimentalists because of the lack of reliable technology to fabricate uniform nanogaps with atomic-scale resolution and high throughput. Here we introduce a new patterning technology based on atomic layer deposition and simple adhesive-tape-based planarization. Using this method, we create vertically oriented gaps in opaque metal films along the entire contour of a millimetre-sized pattern, with gap widths as narrow as 9.9 angstrom, and pack 150,000 such devices on a 4-inch wafer. Electromagnetic waves pass exclusively through the nanogaps, enabling background-free transmission measurements. We observe resonant transmission of near-infrared waves through 1.1-nm-wide gaps (lambda/1,295) and measure an effective refractive index of 17.8. We also observe resonant transmission of millimetre waves through 1.1-nm-wide gaps (lambda/4,000,000) and infer an unprecedented field enhancement factor of 25,000. | - |
dc.identifier.bibliographicCitation | NATURE COMMUNICATIONS, v.4, pp.2361 | - |
dc.identifier.doi | 10.1038/ncomms3361 | - |
dc.identifier.issn | 2041-1723 | - |
dc.identifier.scopusid | 2-s2.0-84884171914 | - |
dc.identifier.uri | https://scholarworks.unist.ac.kr/handle/201301/26326 | - |
dc.identifier.url | https://www.nature.com/articles/ncomms3361 | - |
dc.identifier.wosid | 000325531000001 | - |
dc.language | 영어 | - |
dc.publisher | NATURE PUBLISHING GROUP | - |
dc.title | Atomic layer lithography of wafer-scale nanogap arrays for extreme confinement of electromagnetic waves | - |
dc.type | Article | - |
dc.description.isOpenAccess | FALSE | - |
dc.relation.journalWebOfScienceCategory | Multidisciplinary Sciences | - |
dc.relation.journalResearchArea | Science & Technology - Other Topics | - |
dc.type.docType | Article | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.subject.keywordPlus | ENHANCED RAMAN-SPECTROSCOPY | - |
dc.subject.keywordPlus | OPTICAL-TRANSMISSION | - |
dc.subject.keywordPlus | PLASMONIC NANOGAP | - |
dc.subject.keywordPlus | FIELD ENHANCEMENT | - |
dc.subject.keywordPlus | LIGHT | - |
dc.subject.keywordPlus | GUIDES | - |
dc.subject.keywordPlus | DEPOSITION | - |
dc.subject.keywordPlus | APERTURES | - |
dc.subject.keywordPlus | QUANTUM | - |
dc.subject.keywordPlus | FILMS | - |
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