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DC Field | Value | Language |
---|---|---|
dc.citation.endPage | 256 | - |
dc.citation.number | 2 | - |
dc.citation.startPage | 252 | - |
dc.citation.title | PARTICLE & PARTICLE SYSTEMS CHARACTERIZATION | - |
dc.citation.volume | 31 | - |
dc.contributor.author | Qin, Zhengtao | - |
dc.contributor.author | Joo, Jinmyoung | - |
dc.contributor.author | Gu, Luo | - |
dc.contributor.author | Sailor, Michael J. | - |
dc.date.accessioned | 2023-12-22T03:06:32Z | - |
dc.date.available | 2023-12-22T03:06:32Z | - |
dc.date.created | 2019-01-08 | - |
dc.date.issued | 2014-02 | - |
dc.description.abstract | Size-controlled porous silicon-based nanoparticles are prepared by pulsed electrochemical etching of single crystal silicon wafers, followed by ultrasonic fracture of the freestanding porous layer. When high-current density pulses are applied periodically during the porous layer etching process, a porous multilayer results in which porous layers are separated by thin layers of much higher porosity. Ultrasonic fracture selectively cleaves the porous film along these high-porosity perforations, providing greater size control and improved yields (by 5x) of the resulting porous nanoparticles. The effect of pulse width and repetition rate is systematically studied: tunability of the average nanoparticle size in the range 160-350 nm is demonstrated. | - |
dc.identifier.bibliographicCitation | PARTICLE & PARTICLE SYSTEMS CHARACTERIZATION, v.31, no.2, pp.252 - 256 | - |
dc.identifier.doi | 10.1002/ppsc.201300244 | - |
dc.identifier.issn | 0934-0866 | - |
dc.identifier.scopusid | 2-s2.0-84893914534 | - |
dc.identifier.uri | https://scholarworks.unist.ac.kr/handle/201301/25695 | - |
dc.identifier.url | https://onlinelibrary.wiley.com/doi/full/10.1002/ppsc.201300244 | - |
dc.identifier.wosid | 000331904500010 | - |
dc.language | 영어 | - |
dc.publisher | WILEY-V C H VERLAG GMBH | - |
dc.title | Size Control of Porous Silicon Nanoparticles by Electrochemical Perforation Etching | - |
dc.type | Article | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
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