File Download

There are no files associated with this item.

  • Find it @ UNIST can give you direct access to the published full text of this article. (UNISTARs only)
Related Researcher

DingFeng

Ding, Feng
Read More

Views & Downloads

Detailed Information

Cited time in webofscience Cited time in scopus
Metadata Downloads

Full metadata record

DC Field Value Language
dc.citation.number 14 -
dc.citation.startPage 1800255 -
dc.citation.title ADVANCED MATERIALS INTERFACES -
dc.citation.volume 5 -
dc.contributor.author Wang, Zhu-Jun -
dc.contributor.author Ding, Feng -
dc.contributor.author Eres, Gyula -
dc.contributor.author Antonietti, Markus -
dc.contributor.author Schloegl, Robert -
dc.contributor.author Willinger, Marc Georg -
dc.date.accessioned 2023-12-21T20:37:20Z -
dc.date.available 2023-12-21T20:37:20Z -
dc.date.created 2018-08-29 -
dc.date.issued 2018-07 -
dc.description.abstract A new mechanism by which catalytic chemical vapor deposition of graphene spontaneously terminates at a single layer on Pt foils is discussed. This self-limited growth regime is identified by direct imaging of adlayer graphene evolution using in-situ environmental scanning electron microscopy. Two fundamentally different mechanisms for adlayer nucleation are revealed. Besides primary nucleation, which is the standard nucleation that occurs only at the onset of growth, a secondary nucleation of adlayers is observed near full coverage of the substrate. Direct observation reveals layer-dependent growth kinetics and the establishment of a dynamic equilibrium between the forward reaction of carbon incorporation and the reverse reaction of graphene etching. Increasing coverage of the active catalyst gives rise to a spontaneous reversal of adlayer evolution from growth to etching. The growth reversal has important practical benefits. It creates a self-limited growth regime in which all adlayer graphene is removed and it enables large-scale production of 100% single-layer graphene. -
dc.identifier.bibliographicCitation ADVANCED MATERIALS INTERFACES, v.5, no.14, pp.1800255 -
dc.identifier.doi 10.1002/admi.201800255 -
dc.identifier.issn 2196-7350 -
dc.identifier.scopusid 2-s2.0-85047398804 -
dc.identifier.uri https://scholarworks.unist.ac.kr/handle/201301/24718 -
dc.identifier.url https://onlinelibrary.wiley.com/doi/abs/10.1002/admi.201800255 -
dc.identifier.wosid 000439739000008 -
dc.language 영어 -
dc.publisher WILEY -
dc.title Formation Mechanism, Growth Kinetics, and Stability Limits of Graphene Adlayers in Metal-Catalyzed CVD Growth -
dc.type Article -
dc.description.isOpenAccess FALSE -
dc.relation.journalWebOfScienceCategory Chemistry, Multidisciplinary; Materials Science, Multidisciplinary -
dc.relation.journalResearchArea Chemistry; Materials Science -
dc.description.journalRegisteredClass scie -
dc.description.journalRegisteredClass scopus -
dc.subject.keywordAuthor adlayer nucleation -
dc.subject.keywordAuthor catalytic chemical vapor deposition -
dc.subject.keywordAuthor graphene growth -
dc.subject.keywordAuthor in-situ -
dc.subject.keywordAuthor self-limited growth -
dc.subject.keywordPlus CHEMICAL-VAPOR-DEPOSITION -
dc.subject.keywordPlus SINGLE-CRYSTAL GRAPHENE -
dc.subject.keywordPlus SCANNING-TUNNELING-MICROSCOPY -
dc.subject.keywordPlus EPITAXIAL GRAPHENE -
dc.subject.keywordPlus CARBON -
dc.subject.keywordPlus COPPER -
dc.subject.keywordPlus CU -
dc.subject.keywordPlus DYNAMICS -
dc.subject.keywordPlus SOLUBILITY -
dc.subject.keywordPlus RUTHENIUM -

qrcode

Items in Repository are protected by copyright, with all rights reserved, unless otherwise indicated.