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Formation Mechanism, Growth Kinetics, and Stability Limits of Graphene Adlayers in Metal-Catalyzed CVD Growth

Author(s)
Wang, Zhu-JunDing, FengEres, GyulaAntonietti, MarkusSchloegl, RobertWillinger, Marc Georg
Issued Date
2018-07
DOI
10.1002/admi.201800255
URI
https://scholarworks.unist.ac.kr/handle/201301/24718
Fulltext
https://onlinelibrary.wiley.com/doi/abs/10.1002/admi.201800255
Citation
ADVANCED MATERIALS INTERFACES, v.5, no.14, pp.1800255
Abstract
A new mechanism by which catalytic chemical vapor deposition of graphene spontaneously terminates at a single layer on Pt foils is discussed. This self-limited growth regime is identified by direct imaging of adlayer graphene evolution using in-situ environmental scanning electron microscopy. Two fundamentally different mechanisms for adlayer nucleation are revealed. Besides primary nucleation, which is the standard nucleation that occurs only at the onset of growth, a secondary nucleation of adlayers is observed near full coverage of the substrate. Direct observation reveals layer-dependent growth kinetics and the establishment of a dynamic equilibrium between the forward reaction of carbon incorporation and the reverse reaction of graphene etching. Increasing coverage of the active catalyst gives rise to a spontaneous reversal of adlayer evolution from growth to etching. The growth reversal has important practical benefits. It creates a self-limited growth regime in which all adlayer graphene is removed and it enables large-scale production of 100% single-layer graphene.
Publisher
WILEY
ISSN
2196-7350
Keyword (Author)
adlayer nucleationcatalytic chemical vapor depositiongraphene growthin-situself-limited growth
Keyword
CHEMICAL-VAPOR-DEPOSITIONSINGLE-CRYSTAL GRAPHENESCANNING-TUNNELING-MICROSCOPYEPITAXIAL GRAPHENECARBONCOPPERCUDYNAMICSSOLUBILITYRUTHENIUM

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