Preparation of EVOH and aramid-modified polar nylon membrane for the removal of hard and soft colloidal particles

Abstract

For the efficient particle removal in an aged semiconductor photoresist solution, a nylon membrane having micro-sized pores was modified into membranes having nano-sized pores. Polyethylene(co-vinyl alcohol) and aramid were used as pore fillers to modify the membrane. The removable capability of soft and hard nano-colloids was systematically investigated. Porosity minimization, improved rejection efficiency, solvent resistance, and enhanced wettability were observed at the modified nylon composite membranes. The aramid pore-filled membrane showed higher rejection (>95%) than the virgin or the EVOH modified membrane, showing good feasibility for use as a separator for particle removal in a semiconductor process.