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| DC Field | Value | Language |
|---|---|---|
| dc.citation.number | 17 | - |
| dc.citation.startPage | 17C306 | - |
| dc.citation.title | JOURNAL OF APPLIED PHYSICS | - |
| dc.citation.volume | 113 | - |
| dc.contributor.author | Shin, Yooleemi | - |
| dc.contributor.author | Tuan, Douong Anh | - |
| dc.contributor.author | Hwang, Younghun | - |
| dc.contributor.author | Cuong, Tran Viet | - |
| dc.contributor.author | Cho, Sunglae | - |
| dc.date.accessioned | 2023-12-22T04:07:42Z | - |
| dc.date.available | 2023-12-22T04:07:42Z | - |
| dc.date.created | 2017-02-23 | - |
| dc.date.issued | 2013-04 | - |
| dc.description.abstract | In this work, the growth and ferromagnetic properties of -FeSi thin film on Si(100) substrate prepared by molecular beam epitaxy are reported. The inter-diffusion of Fe layer on Si(100) substrate at 600 °C results in polycrystalline -FeSi layer. The determined activation energy was 0.044 eV. The modified magnetism from paramagnetic in bulk to ferromagnetic states in -FeSi thin films was observed. The saturated magnetization and coercive field of -FeSi film are 4.6 emu/cm3 and 29 Oe at 300 K, respectively. | - |
| dc.identifier.bibliographicCitation | JOURNAL OF APPLIED PHYSICS, v.113, no.17, pp.17C306 | - |
| dc.identifier.doi | 10.1063/1.4800839 | - |
| dc.identifier.issn | 0021-8979 | - |
| dc.identifier.scopusid | 2-s2.0-84877751912 | - |
| dc.identifier.uri | https://scholarworks.unist.ac.kr/handle/201301/21417 | - |
| dc.identifier.url | http://aip.scitation.org/doi/10.1063/1.4800839 | - |
| dc.identifier.wosid | 000319292800174 | - |
| dc.language | 영어 | - |
| dc.publisher | AMER INST PHYSICS | - |
| dc.title | Formation and ferromagnetic properties of FeSi thin films | - |
| dc.type | Article | - |
| dc.description.journalRegisteredClass | scie | - |
| dc.description.journalRegisteredClass | scopus | - |
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