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Seok, Sang Il
Laboratory for Energy Harvesting Materials and Systems
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Annealing effect on photoluminescence properties of Er doped Al2O3-SiO2 sol-gel films

Author(s)
Kwon, Jeong OhSeok, Sang IlJung, Dongwoon
Issued Date
2006-08
DOI
10.1016/j.jnoncrysol.2006.02.086
URI
https://scholarworks.unist.ac.kr/handle/201301/18677
Fulltext
http://www.sciencedirect.com/science/article/pii/S0022309306005394
Citation
JOURNAL OF NON-CRYSTALLINE SOLIDS, v.352, no.26-27, pp.2841 - 2845
Abstract
Annealing effect on photoluminescence intensity of Er doped Al2O3-SiO2 prepared from Er doped boehmite (AlOOH) and GPS (3-glycidoxypropyltrimethoxysilane) hybrid was investigated. The emission intensities peaked at 1.54 mu m, which correspond to the I-4(13/2) -> I-4(15/2) transition of the Er3+ ion, are greatly increased by about 8 times between 900 and 1000 degrees C, than that expected from TGA associated with the elimination of hydroxyl groups which is responsible for the fluorescence quenching. The residual hydroxyl groups for Er doped Al2O3-SiO2 after annealing at high temperature was further analyzed by FT-IR. Finally, fluorescence intensities were compared with the variation of BET surface areas against the annealing temperature. It was found that photoluminescence intensity below 1000 degrees C was more dependent on surface hydroxyl groups re-adsorbed by a high specific surface area rather than internal hydroxyl groups remained in gel film. (c) 2006 Elsevier B.V. All rights reserved
Publisher
ELSEVIER SCIENCE BV
ISSN
0022-3093
Keyword (Author)
optical propertiessol-gel process
Keyword
PLANAR WAVE-GUIDESMU-MOPTICAL AMPLIFICATIONFLUORESCENCEFABRICATIONSILICON

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