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신태주

Shin, Tae Joo
Synchrotron Radiation Research Lab.
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dc.citation.endPage 364 -
dc.citation.startPage 359 -
dc.citation.title MOLECULAR CRYSTALS AND LIQUID CRYSTALS -
dc.citation.volume 371 -
dc.contributor.author Yu, Jinshu -
dc.contributor.author Zhou, D -
dc.contributor.author Cai, W -
dc.contributor.author Park, SH -
dc.contributor.author Shin, Tae Joo -
dc.contributor.author Oh, W -
dc.contributor.author Lee, SW -
dc.contributor.author Ree, M -
dc.date.accessioned 2023-12-22T11:44:59Z -
dc.date.available 2023-12-22T11:44:59Z -
dc.date.created 2015-09-04 -
dc.date.issued 2001-04 -
dc.description.abstract For an epoxy resin waterborne system mixed with a curing agent, butanone oxime blocked 4,4'-methylenediphenyldiisocyanate, curing-reaction-induced residual stress generation was in-situ measured in thin films adhered on silicon substrates. This measurement was carried out with varying composition as well as curing temperature, time and step. The residual stress was dependent upon the composition, the deblocking process of the curing agent and the curing condition. In addition, cured films were examined by FT-IR spectroscopy, differential scanning calorimetry, and thermogravimetric analysis -
dc.identifier.bibliographicCitation MOLECULAR CRYSTALS AND LIQUID CRYSTALS, v.371, pp.359 - 364 -
dc.identifier.doi 10.1080/10587250108024760 -
dc.identifier.issn 1542-1406 -
dc.identifier.scopusid 2-s2.0-31944433151 -
dc.identifier.uri https://scholarworks.unist.ac.kr/handle/201301/16644 -
dc.identifier.url http://www.tandfonline.com/doi/abs/10.1080/10587250108024760#.VekIMyXtlBc -
dc.identifier.wosid 000172816400089 -
dc.language 영어 -
dc.publisher TAYLOR & FRANCIS LTD -
dc.title FT-IR spectroscopic and residual stress studies on curing of epoxy resin waterborne -
dc.type Article -

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