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Shin, Tae Joo
UNIST Synchrotron Radiation Research Laboratory
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  • Synchrotron Radiation Application Researches

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FT-IR spectroscopic and residual stress studies on curing of epoxy resin waterborne

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Title
FT-IR spectroscopic and residual stress studies on curing of epoxy resin waterborne
Author
Yu, JinshuZhou, DCai, WPark, SHShin, Tae JooOh, WLee, SWRee, M
Keywords
Blocked isocyanate; Curing reaction; Deblocking reaction; Epoxy resin waterborne; Network formation; Residual stress
Issue Date
2001-04
Publisher
TAYLOR & FRANCIS LTD
Citation
MOLECULAR CRYSTALS AND LIQUID CRYSTALS, v.371, no., pp.359 - 364
Abstract
For an epoxy resin waterborne system mixed with a curing agent, butanone oxime blocked 4,4'-methylenediphenyldiisocyanate, curing-reaction-induced residual stress generation was in-situ measured in thin films adhered on silicon substrates. This measurement was carried out with varying composition as well as curing temperature, time and step. The residual stress was dependent upon the composition, the deblocking process of the curing agent and the curing condition. In addition, cured films were examined by FT-IR spectroscopy, differential scanning calorimetry, and thermogravimetric analysis
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DOI
10.1080/10587250108024760
ISSN
1542-1406
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SE_Journal Papers
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