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DC Field | Value | Language |
---|---|---|
dc.citation.endPage | 144 | - |
dc.citation.number | 1 | - |
dc.citation.startPage | 138 | - |
dc.citation.title | Journal of the Korean Society for Precision Engineering | - |
dc.citation.volume | 25 | - |
dc.contributor.author | Lee, Seung Pyo | - |
dc.contributor.author | Lee, In Hwan | - |
dc.contributor.author | CHO, DONG-WOO | - |
dc.contributor.author | Ko, Tae Jo | - |
dc.contributor.author | Kang, Hyun Wook | - |
dc.date.accessioned | 2023-12-22T08:15:38Z | - |
dc.date.available | 2023-12-22T08:15:38Z | - |
dc.date.created | 2015-08-04 | - |
dc.date.issued | 2008-11 | - |
dc.description.abstract | Micro-machining of a brittle material such as glass, silicon, etc., is important in micro fabrication. Particularly, micro-abrasive jet machining (μ-AJM) has become a useful technique for micro-machining of such materials. The μ-AJM process is mainly based on the erosion of a mask which protects brittle substrate against high velocity of micro-particle. Therefore, fabrication of an adequate mask is very important. Generally, for the fabrication of a mask in the μ-AJM process, a photomask based on the semi-conductor fabrication process was used. In this research a rapid mask fabrication technology has been developed for the μ-AJM. By scanning the focused UV laser beam, a micro-mask pattern was fabricated directly without photolithography process and photomask. Two kinds of mask patterns were fabricated using SU-8 and photopolymer (Watershed 11110). Using fabricated mask patterns, abrasive-jet machining of Si wafer were conducted successfully | - |
dc.identifier.bibliographicCitation | Journal of the Korean Society for Precision Engineering, v.25, no.1, pp.138 - 144 | - |
dc.identifier.issn | 1225-9071 | - |
dc.identifier.uri | https://scholarworks.unist.ac.kr/handle/201301/13342 | - |
dc.identifier.url | http://www.kci.go.kr/kciportal/ci/sereArticleSearch/ciSereArtiView.kci?sereArticleSearchBean.artiId=ART001209172&locale=en&SID=U278MC5OPZAlH6VbDaQ | - |
dc.language | 한국어 | - |
dc.publisher | Korean Society for Precision Engineering | - |
dc.title.alternative | 미세입자 분사가공을 위한 쾌속 마스크 제작기술의 개발 | - |
dc.title | Development of Rapid Mask Fabrication Technology for Micro-abrasive Jet Machining | - |
dc.type | Article | - |
dc.description.isOpenAccess | FALSE | - |
dc.identifier.kciid | ART001209172 | - |
dc.description.journalRegisteredClass | kci | - |
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