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Lee, Geunsik
Computational Research on Electronic Structure and Transport in Condensed Materials
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dc.citation.endPage 44 -
dc.citation.number 1-2 -
dc.citation.startPage 44 -
dc.citation.title COMPUTER PHYSICS COMMUNICATIONS -
dc.citation.volume 177 -
dc.contributor.author Lee, Geunsik -
dc.contributor.author Kim, Jai Sam -
dc.date.accessioned 2023-12-22T09:11:58Z -
dc.date.available 2023-12-22T09:11:58Z -
dc.date.created 2015-08-03 -
dc.date.issued 2007-07 -
dc.description.abstract The energy of adsorption of group III elements like Al, Ga, In, Tl on Si (111) is calculated based on density-functional theory (DFT). VASP code in conjunction with ultrasoft potentials within the generalized-gradient approximations (GGA) are used for the calculation. The cutoff energy of 150 eV and one special k point are used, which gives an energy error of a few meV per adatom. The lowest-energy site is top-site for Al, Ga and bridge-site for In, Tl. The highest-energy site is hollow-site for Al, Ga, In and top-site for Tl. The dangling bond saturation and coordination number are the two factors that govern the adatom stability. Coordination number is more important for Al but with increasing metal atom's radius factor, dangling bond saturation becomes more essential than coordination number. -
dc.identifier.bibliographicCitation COMPUTER PHYSICS COMMUNICATIONS, v.177, no.1-2, pp.44 - 44 -
dc.identifier.doi 10.1016/j.cpc.2007.02.060 -
dc.identifier.issn 0010-4655 -
dc.identifier.scopusid 2-s2.0-34250900908 -
dc.identifier.uri https://scholarworks.unist.ac.kr/handle/201301/13291 -
dc.identifier.url http://www.sciencedirect.com/science/article/pii/S0010465507001282 -
dc.identifier.wosid 000248161700015 -
dc.language 영어 -
dc.publisher ELSEVIER SCIENCE BV -
dc.title.alternative Adsorption energies of Al, Ga, In, Tl on Si(111)-7x7 -
dc.title Adsorption energies of Al, Ga, In, Tl on Si(111)-7x7 -
dc.type Article -
dc.description.journalRegisteredClass scopus -

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