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Lee, Jae Sung
Eco-friendly Catalysis & Energy Lab.
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dc.citation.endPage 64 -
dc.citation.number 1 -
dc.citation.startPage 57 -
dc.citation.title CATALYSIS TODAY -
dc.citation.volume 54 -
dc.contributor.author Lee, Jae Sung -
dc.contributor.author Park, Eun Duck -
dc.contributor.author Song, Byung Jun -
dc.date.accessioned 2023-12-22T12:09:40Z -
dc.date.available 2023-12-22T12:09:40Z -
dc.date.created 2015-07-24 -
dc.date.issued 1999-11 -
dc.description.abstract A new process has been developed to oxidize CO at low temperatures (<423 K) in vent streams that also contain halogenated compounds and water, A PdCl2-CuCl2 catalyst supported on carbon was successfully implemented to treat the oxidation reactor vent stream of a terephthalic acid plant that contained water, CH3Br and other organic compounds in addition to CO. The CH3Br remained intact during the treatment and did not deactivate the catalyst. In this catalyst system, palladium remained as a molecular Pd(II) species while solid Cu2Cl(OH)(3) was the active copper phase. The formation of stable Cu2Cl(OH)(3) was essential for activity and stability of the catalyst, After obtaining a stable catalytic activity for six months in a pilot plant test with a side stream of real vent gases, the first installation and operation of the process were made successfully to handle 50,000 Nm(3)/h of vent stream in a terephthalic acid plant. (C) 1999 Elsevier Science B.V. All rights reserved -
dc.identifier.bibliographicCitation CATALYSIS TODAY, v.54, no.1, pp.57 - 64 -
dc.identifier.doi 10.1016/S0920-5861(99)00168-6 -
dc.identifier.issn 0920-5861 -
dc.identifier.scopusid 2-s2.0-0003161296 -
dc.identifier.uri https://scholarworks.unist.ac.kr/handle/201301/12710 -
dc.identifier.url http://www.sciencedirect.com/science/article/pii/S0920586199001686# -
dc.identifier.wosid 000084129700008 -
dc.language 영어 -
dc.publisher ELSEVIER SCIENCE BV -
dc.title.alternative Process development for low temperature CO oxidation in the presence of water and halogen compounds -
dc.title Process development for low temperature CO oxidation in the presence of water and halogen compounds -
dc.type Article -
dc.description.journalRegisteredClass scopus -

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